Thin Film Device Applications 1983
DOI: 10.1007/978-1-4613-3682-2_5
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Magnetic Thin Film Devices

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Cited by 13 publications
(14 citation statements)
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“…The presence of the large phosphate particles is believed to be due to the deposition of colloidal polyphosphate material from solution in which the ZDDP has decomposed. These findings are in agreement with the mechanism proposed by Suominen Fuller et al, and also parallels the mechanism by which thin films of II-V and IV-VI compound semiconductors are deposited by a controlled homogeneous precipitation technique. Kaur, Pandy, and Chopra 24 found that growth of CdS films takes place either by ion-by-ion condensation of Cd 2+ and S 2- , or by the adsorption of colloidal particles of CdS formed in solution, depending on the various deposition parameters and the method of preparation. In our case, ZDDP decomposition, and hence, film growth, are not linear .…”
Section: Resultssupporting
confidence: 88%
“…The presence of the large phosphate particles is believed to be due to the deposition of colloidal polyphosphate material from solution in which the ZDDP has decomposed. These findings are in agreement with the mechanism proposed by Suominen Fuller et al, and also parallels the mechanism by which thin films of II-V and IV-VI compound semiconductors are deposited by a controlled homogeneous precipitation technique. Kaur, Pandy, and Chopra 24 found that growth of CdS films takes place either by ion-by-ion condensation of Cd 2+ and S 2- , or by the adsorption of colloidal particles of CdS formed in solution, depending on the various deposition parameters and the method of preparation. In our case, ZDDP decomposition, and hence, film growth, are not linear .…”
Section: Resultssupporting
confidence: 88%
“…on amorphous carbon (a-C), SiO 2 , Al 2 O 3 or NaCl substrates observed by transmission electron microscopy (TEM). [10][11][12][13][14][15][16] These TEM results demonstrated clearly that the metal films follow Volmer-Weber type mode. However, there are less reports on the early stages of ITO film growth observed by TEM and various methods used in the previous studies for ITO film growth are indirect observations.…”
mentioning
confidence: 55%
“…Here we use weight method to measure thickness as the following: The film thickness (t) can be measured by evaporating certain weight (m) of material, if the distance between the evaporation boat and the substrate was (r) and the density of material in its bulk was (ρ). Thus, the film thickness is given by the following equation [6]:…”
Section: Materials and Methodologymentioning
confidence: 99%