&lt;title&gt;Kinetics of chemically amplified resists&lt;/title&gt;

Wallraff, Gregory M.; Hinsberg, William D.; Houle, Frances A.; Opitz, Juliann; Hopper, D.A.; Hutchinson, John M.

doi:10.1117/12.210391

Cited by 15 publications

(15 citation statements)

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“…An auto-acceleration effect by the reaction products, reported for a hydroxystyrene system [19], was not observed in these experiments. This is consistent with the results from Paniez et al [20], which use a similar methacrylate system.…”

Section: Acid-catalyzed Reaction Modelmentioning

confidence: 52%

“…The trends are similar to the results at 130 C especially the persistence of low deprotection extents at low doses, signifying that the reaction rate is suppressed. In many cases, the deprotection products are highly volatile and a rapid outgassing is followed by a volume relaxation of the polymer film [28]. The methylene adamantane products in this system are relatively large and were expected to lead to limited outgassing.…”

Section: Resultsmentioning

confidence: 99%

“…This assumption is appropriate for strong acids, such as perfluorobutanesulfonic acid. However, weaker acids are less dissociated in weakly polar or even non-polar polymer matrices [19]. The FTIR data over a range of processing conditions (exposure dose, temperature) can be fitted with the model to determine physically meaningful parameters such as the reaction rate constant.…”

Section: Acid-catalyzed Reaction Modelmentioning

confidence: 99%

“…The k P is the apparent acid catalysis reaction rate constant. Earlier investigations assumed that the acid-catalyzed reaction rate follows first-order kinetics in concentration of acid and reactant [19,22,23]. Zuniga and Neureuther found first-order reaction kinetics are unable to explain a nonlinear behavior of feature critical dimension on dose [24].…”

Section: Acid-catalyzed Reaction Modelmentioning

confidence: 99%

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Effect of copolymer composition on acid-catalyzed deprotection reaction kinetics in model photoresists

Kang

Prabhu

Vogt

et al. 2006

Polymer

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Section: Acid-catalyzed Reaction Modelmentioning

confidence: 52%

Section: Resultsmentioning

confidence: 99%

Section: Acid-catalyzed Reaction Modelmentioning

confidence: 99%

Section: Acid-catalyzed Reaction Modelmentioning

confidence: 99%

See 2 more Smart Citations

Effect of copolymer composition on acid-catalyzed deprotection reaction kinetics in model photoresists

Kang

Prabhu

Vogt

et al. 2006

Polymer

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“…2, because the difference in the sensitivity between trifluoromethanesulfonate and p-toluenesulfonate resists diminished at higher temperature. Actually, it has been reported that phenolic hydroxyl groups of PHS, which has weak acidity (PKa8l = -1), dissociate and work as a catalyst for decomposition of t-Boc and carboxylic ester groups at high PEB temperatures [15][16][17].…”

Section: Methodsmentioning

confidence: 99%

Effect of Dissociation Constant of Catalytic Acids on the Characteristics of Chemically Amplified Resists.

Nakamura¹,

Ban²,

Tanaka³

1997

J. Photopol. Sci. Technol.

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We investigate the influence of the strength of catalytic acids on the characteristics of chemically amplified positive resists composed of t-Boc-protected-polyhydroxystyrene and acid generators. It is clarified that weaker acidity results in a stronger dependence of resist sensitivity on post-exposure baking temperature and a smaller dissolution rate contrast for development.These phenomena can be explained in terms of the degree of dissociation of acid molecules.Effects of the degree of dissociation on the image contrast and stability for basic contaminants are also discussed quantitatively.

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Chemically amplified, positive tone, cross‐linkable thick‐film polymer

Mueller

Kohl

2013

J of Applied Polymer Sci

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A new class of positive tone, permanent materials has been demonstrated, which are chemically amplified (CA), aqueousdevelopable, and cross-linkable. The intended purpose is a patterning and cross-linking method to create high sensitivity permanent dielectrics for microelectronic devices and packages. The photochemistry is based on traditional CA, acid-catalyzed deprotection of a protected organic functionality to yield an aqueous base soluble group such as a carboxylic acid or alcohol. This CA chemistry produces high contrast and high photo-speed patterning, which is especially valuable for thick-film applications where high UV exposure doses are required for non-CA materials. The photospeed is about an order of magnitude faster than commercial materials at a similar thickness. Subsequent to patterning, the remaining films or features can be cross-linked by a variety of chemical mechanisms. The working photo-patterning and cross-linking mechanisms are demonstrated on a random copolymer of tert-butyl methacrylate (TBMA) and 2-hydroxyethyl methacrylate (HEMA). The optical contrast (at 248 nm) was found to be 12.7 and the sensitivity, D 100 , was calculated to be 50.2 mJ/cm 2 in a 9.07-lm-thick film. Undeveloped regions were cross-linked after patterning. The esterification reaction is much slower than the TBMA deprotection, so that the cross-linking reaction does not interfere with the photopatterning. Cross-linking was also evident by the change in thin film stress 6.2 to 17.9 MPa during a thermal cure. Other polymers for Fischer esterification are discussed with their advantages and disadvantages along with other cross-linking chemistries. V C 2013 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 130: 759-765, 2013

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<title>Kinetics of chemically amplified resists</title>

Cited by 15 publications

References 0 publications

Effect of copolymer composition on acid-catalyzed deprotection reaction kinetics in model photoresists

Effect of copolymer composition on acid-catalyzed deprotection reaction kinetics in model photoresists

Effect of Dissociation Constant of Catalytic Acids on the Characteristics of Chemically Amplified Resists.

Chemically amplified, positive tone, cross‐linkable thick‐film polymer

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