<title>Error Sources In Diffraction Pattern Sampling For Optical Power Spectrum Measurements</title>

Abstract

An overview is presented of major error sources inherent in the diffraction pattern sampling technique as used for power spectrum measurment. Topics include sampling errors in the measurement of diffraction pattern intensities, the normalization of the data and the interaction of the system limiting aperture with the resulting data.Phase effects and other sources of film noise are also treated. The purpose of this discussion is to acquaint workers in this area with the potential for error and to indicate the need for careful interpretation of the data.

Optical power spectrum analysis of display imagery.

“…This technique , discussed further in Appendix A is much more stable than zero frequency normalization. Subsequent work by the author (Schindler , 1977) * indicates that total energy normalization is also a more valid approach for the determination of power signal-to-noise ratios as used in this study .…”

“…Evaluations by the author in Phase I of this work and in a subsequent effort (Schindler 1976(Schindler , 1977 have indicated that the signal dependent portion of the phase effect Is a very small part ( 2% to 3%) of the total contribution. On this basis, we assume in this study that phase effects behave essentially as random film noise and that the subsequent calculation of signal-to-noise ratios at least partly corrects for these effects.…”