2014
DOI: 10.1063/1.4894450
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Low-voltage organic field-effect transistors based on novel high-κ organometallic lanthanide complex for gate insulating materials

Abstract: A novel high-κ organometallic lanthanide complex, Eu(tta)3L (tta=2-thenoyltrifluoroacetonate, L = 4,5-pinene bipyridine), is used as gate insulating material to fabricate low-voltage pentacene field-effect transistors (FETs). The optimized gate insulator exhibits the excellent properties such as low leakage current density, low surface roughness, and high dielectric constant. When operated under a low voltage of −5 V, the pentacene FET devices show the attractive electrical performance, e.g. carrier mobility (… Show more

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Cited by 6 publications
(2 citation statements)
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“…Very low V T of 0.7 V was observed. This is attributed to the used ultrathin high-k HfO 2 dielectric, which is consistent with the reported results . The highest mobility of 2.2 cm 2 ·V –1 ·s –1 was achieved, higher than the reported results for PTCDI-C8 (Table ), , and comparable with the recent reported high mobility of 2.67 cm 2 ·V –1 ·s −1 for BPE-PTCDI .…”
Section: Resultssupporting
confidence: 91%
“…Very low V T of 0.7 V was observed. This is attributed to the used ultrathin high-k HfO 2 dielectric, which is consistent with the reported results . The highest mobility of 2.2 cm 2 ·V –1 ·s –1 was achieved, higher than the reported results for PTCDI-C8 (Table ), , and comparable with the recent reported high mobility of 2.67 cm 2 ·V –1 ·s −1 for BPE-PTCDI .…”
Section: Resultssupporting
confidence: 91%
“…The decreased mobility in the device with HfO 2 is mainly due to the strong interaction at the interface between the conducting channel and high- κ dielectric 29 , 30 . This interaction results in the increased localization of the charge carriers 6 , 31 , 32 , which is consistent with the result that OFETs based SiO 2 exhibit a higher carrier mobility than that based on AlO x . Further studies on the charge carrier properties in our ultrathin molecular crystals is of great interest.…”
Section: Discussionsupporting
confidence: 89%