2008
DOI: 10.1002/pssr.200701267
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Low‐voltage, high‐gain, and high‐mobility organic complementary inverters based on N,N′‐ditridecyl‐3,4,9,10‐perylenetetracarboxylic diimide and pentacene

Abstract: The authors describe an organic complementary inverter with N,N′‐ditridecyl‐3,4,9,10‐perylenetetracarboxylic diimide as an n‐type semiconductor and pentacene as a p‐type semiconductor. Each transistor of the inverter exhibited high carrier mobility: 1.62 cm2/Vs for an n‐type drive transistor and 0.57 cm2/Vs for a p‐type switch transistor. The gain of the inverter reached 125. Another inverter using Ta2O5 as a high κ gate dielectric performed well with a gain of 500 and an operation voltage of only 5 V.magnifie… Show more

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Cited by 44 publications
(30 citation statements)
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“…[ 23 ] The n-type PTCDI-C13 TFTs in our experiment exhibited degradation in the device's performance when the devices were exposed to ambient air ( Figure S4a, Supporting Information), which is consistent with the previous reports. [ 24 ] To prevent the degradation of PTCDI-C13 N-type semiconductor iCVD gate dielectric semiconductors, 25 nm-thick ALD Al 2 O 3 was employed as an inorganic layer for encapsulation, in consideration of the low gas permeability and high transparency of Al 2 O 3 . [ 14 ] However, the deposition of Al 2 O 3 via ALD directly onto the active organic channel layer caused severe degradation in V T and S.S., as well as a decrease in the overall current fl ow in the channel layer ( Figure 3 ).…”
Section: Doi: 101002/aelm201500385mentioning
confidence: 99%
“…[ 23 ] The n-type PTCDI-C13 TFTs in our experiment exhibited degradation in the device's performance when the devices were exposed to ambient air ( Figure S4a, Supporting Information), which is consistent with the previous reports. [ 24 ] To prevent the degradation of PTCDI-C13 N-type semiconductor iCVD gate dielectric semiconductors, 25 nm-thick ALD Al 2 O 3 was employed as an inorganic layer for encapsulation, in consideration of the low gas permeability and high transparency of Al 2 O 3 . [ 14 ] However, the deposition of Al 2 O 3 via ALD directly onto the active organic channel layer caused severe degradation in V T and S.S., as well as a decrease in the overall current fl ow in the channel layer ( Figure 3 ).…”
Section: Doi: 101002/aelm201500385mentioning
confidence: 99%
“…Not only the electrodes but also the active layers were deposited via vacuum deposition, using the following materials. Pentacene, which is well known to have high hole mobility reaching 5.5 cm 2 /V s [10], was used as the active layer for the p-type transistors in this study, and N-N -dioctyl-3,4,9,10-perylene tetracarboxylic diimide with eight alkyl chains (PTCDI-C8) was used for the n-type transistors, among some possible n-type materials [11][12][13].…”
Section: Introductionmentioning
confidence: 99%
“…Pentacene is one of the most widely investigated organic semiconductors for OFETs because of its high intrinsic hole mobility [2]. But the operating voltages required to achieve high hole mobility (µ) from pentacene based OFETs are generally higher than 20 V. In order to address this issue, high-k gate insulators were employed in the pentacene based OFETs [3,4]. However, high-k gate insulator usually has a large surface energy [5], which results in small grain size for pentacene films.…”
Section: Introductionmentioning
confidence: 99%