2021
DOI: 10.1038/s41928-021-00562-4
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Low-power electronic technologies for harsh radiation environments

Abstract: Over the past decades, electronic technologies have evolved to serve a wide range of applications, with some necessitating their reliable operation in harsh radiation environments. This perspective article reviews the current landscape in rad-hard electronics, covering the scope of radiation environments, the application needs, the underlying phenomena that impose functional constraints as well as established design methodologies, relying on commercially available technologies (CMOS) for mitigating e↵ects that… Show more

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Cited by 45 publications
(39 citation statements)
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“…As reported, the trapping arising from Co-60 γ-rays could dope CNT FETs as either negative interface charge trapping or positive oxide charge trapping. 2,21,28 As shown in the energy band diagram of Figure 1b, the polarity of CNT FETs is controlled by applying a contact metal with a suitable work function to enable electron or hole injection into the channels. With exposure to γ-ray irradiation, radiation-induced charge trapping may change the energy band diagram of CNT FETs.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
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“…As reported, the trapping arising from Co-60 γ-rays could dope CNT FETs as either negative interface charge trapping or positive oxide charge trapping. 2,21,28 As shown in the energy band diagram of Figure 1b, the polarity of CNT FETs is controlled by applying a contact metal with a suitable work function to enable electron or hole injection into the channels. With exposure to γ-ray irradiation, radiation-induced charge trapping may change the energy band diagram of CNT FETs.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…Carbon nanotubes (CNTs) have been considered a promising channel material for the construction of high-performance and scaled field-effect transistors (FETs), mainly owing to their outstanding carrier mobility, ultrathin body, and high stability. Furthermore, CNT FETs and ICs have attracted considerable attention for applications in radiation environments because of the small cross section, strong C–C bonds at the nanometer scale, and low atomic numbers of the semiconducting channel. Recently, many works have revealed the high radiation tolerance of CNT FETs by measuring the total ionizing dose (TID) response under different radiation sources, such as ions, γ-rays, and protons. However, similar to the research on the radiation-hardened properties of new materials, such as two-dimensional (2D) layered transition metal dichalcogenides (TMDCs), metal–oxide thin films and graphene, , almost all of the research has focused on the radiation response of whole CNT FETs, and a detailed exploration of how radiation affects every individual component of FETs is absent, which hampers the understanding of the radiation mechanisms and building of radiation models for CNT FETs. As is well known, widely used electrical measurements cannot be utilized to analyze irradiation effects on the individual components of a transistor since radiation-induced interface charges in substrates and oxide charges in gate dielectrics induce opposite shifts in the threshold voltage, leading to a compensating effect …”
Section: Introductionmentioning
confidence: 99%
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“…However, in the future, once the methods are developed for on-chip 3-D integration, the 3-D flash memories could present a viable option. In addition, recent times have seen the emergence of new semiconductor devices and memory technologies as a result of continuous scientific efforts [128,129]. Recently, silicon photonic devices have also been experimented to find out the radiation effects [130][131][132][133].…”
Section: Discussionmentioning
confidence: 99%
“…The electrical properties of the most‐widely‐used silicon devices degrade in space, nuclear, and avionic applications. [ 1,2 ] This is because persistent ionizing irradiation induces Eγ centers in the dielectric silica (SiO 2 ) layer and P b centers at the silica/silicon (SiO 2 /Si) interface, respectively, [ 3,4 ] which act as oxide‐trapped charges and interface traps (usually denoted as Δ N ot and Δ N it ) in the SiO 2 ‐Si structures and alter the performance of the devices, [ 5 ] called as a total ionizing dose (TID) effect. The Eγ centers are positively charged states of oxygen vacancies with puckered configuration (VOγ), [ 3,6 ] while the P b centers are positively charged silicon dangling bonds.…”
Section: Introductionmentioning
confidence: 99%