We report on the low frequency ͓1/ f and generation-recombination ͑GR͔͒ noise in InAlAs/InGaAs modulation doped field effect transistors with a 50-nm gate length. The characteristic capture and emission times of the GR noise depended on the gate voltage. Measurements of the noise as a function of the gate voltage showed that the gate leakage current, contacts, and ungated sections of the channel did not contribute to the 1 / f noise. The gate voltage dependence of the 1 / f noise agreed well with the model of number of carriers fluctuations as a source of the 1 / f noise. An effective density of traps responsible for the 1 / f noise was found to be D eff Ϸ 2.7ϫ 10 12 cm −2 eV −1 .