2007
DOI: 10.1117/12.721272
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Low-cost far infrared bolometer camera for automotive use

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Cited by 29 publications
(16 citation statements)
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“…For a given pixel pitch, there are several design issues relating to both the sensor material and the sensor-to-ROIC integration process that must be considered to reach overall good performance. We have previously reported on some aspects of sensor material design and optimization [6,7] and on the integration process for 25x25 µm pitch pixels [8][9][10]. In this paper we will address further design aspects of the infrared absorbing internal quarter wave cavity and present the latest results on scaling of the heterogeneous integration process down to 17x17 µm pitch bolometer arrays.…”
Section: Introductionmentioning
confidence: 99%
“…For a given pixel pitch, there are several design issues relating to both the sensor material and the sensor-to-ROIC integration process that must be considered to reach overall good performance. We have previously reported on some aspects of sensor material design and optimization [6,7] and on the integration process for 25x25 µm pitch pixels [8][9][10]. In this paper we will address further design aspects of the infrared absorbing internal quarter wave cavity and present the latest results on scaling of the heterogeneous integration process down to 17x17 µm pitch bolometer arrays.…”
Section: Introductionmentioning
confidence: 99%
“…Today, commonly used thermistor materials such as vanadium oxide (VO x ), amorphous, and polycrystalline semiconductors demonstrate moderate noise levels and TCR values around 2%-4% (Lv, Hu, Wu, & Liu, 2007;Moreno, Kosarev, Torres, & Ambrosio, 2007). Recent studies have proposed single crystalline (sc) SiGe as a thermistor material (Di Benedetto, Kolahdouz, Malm, Ostling, & H. H. Radamson, 2009;Vieider et al, 2007;S. Wissmar, H. Radamson, Kolahdouz, & J. Y. Andersson, 2008) demonstrating a high signal-to-noise level.…”
Section: Figures Of Merit For Thermistor Materialsmentioning
confidence: 99%
“…Using Via-Last Processes Demonstrations of via-first heterogeneous integration technologies for MEMS and NEMS include infrared bolometer arrays [8][9][10][11][12][13][14], arrays of tilting and piston-type micro-mirrors [14][15][16][17][18], micro-pirani vacuum gauges [19], RF MEMS [1,20] and many more devices [1]. For most of these applications, adhesive wafer bonding has been used to join the MEMS and the IC wafers.…”
Section: B Wafer-level Heterogeneous 3d Integration Platformsmentioning
confidence: 99%