“…The (GaAs) n /(AlAs) m is one of the most important SL since the development of high electron mobility transistors (HEMT) and quantum cascade lasers (QCLs) a few decades ago [ 1 – 6 ]. Recently with the advances of film epitaxy and nanofabrication techniques, the (GaAs) n /(AlAs) m based SLs and nanodevices with (n + m) ranging from 2 to 10 have demonstrated exciting physical properties related to luminescence and optical absorption, two-phonon absorption, and Raman as well as infrared spectra, which thus found promising applications in optoelectronics, sensing, LED, energy and laser related civilian and industrial areas [ 7 – 12 ]. Meanwhile, toward other critical high-tech applications such as aerospace, high-energy physics, gravitational wave detection, astronomy, space travel, nuclear and national security related areas, the semiconductor SLs and devices are exposed to different radiation environments, i.e., X-ray, neutrons, electrons, ions, etc., which may result in the generation of defects containing impurities, vacancies, interstitials, antisites, and complex of these.…”