Lithographically patterned silicon nanostructures on silicon substrates

Megouda, Nacéra; Piret, Gaëlle; Galopin, Élisabeth; Coffinier, Yannick; Hadjersi, Toufik; Elkechai, Omar; Boukherroub, Rabah

doi:10.1016/j.apsusc.2012.02.085

Cited by 10 publications

(6 citation statements)

References 33 publications

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“…The combination of modern lithography techniques and MACE provide a solution to fabricate ordered and patterned SiNWAs with controlled diameter, length and density. This two-step strategy includes (i) pre-patterning silicon substrate by laser interference lithography, [21][22][23][24] nanosphere lithography, [25][26][27] electron beam lithography, 28 block copolymer lithography 29 and photolithography, 30,31 and (ii) etching selective areas of silicon to achieve well-dened SiNWAs. Several typical fabrication processes of patterned SiNWAs are illustrated in Fig.…”

Section: Patterning Of Sinwasmentioning

confidence: 99%

Vertical SiNWAs for biomedical and biotechnology applications

Liu

2014

J. Mater. Chem. B

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Vertical silicon nanowire arrays (SiNWAs) are considered as one of the most promising nanomaterials. Notably, silicon-based nanomaterials exhibit excellent biocompatibility, and the diameters of silicon nanowires are comparable to the dimensions of many biological molecules, providing SiNWAs with great potential for life science applications. In this review, we first briefly introduce the synthesis, patterning and surface functionalization of SiNWAs and then focus on the recent progress in the application of SiNWAs for biosensors, studies on mammalian cells or bacteria with nanomaterials, controlled capture/ adsorption and release of cells or proteins, drug delivery, DNA transformation, antifouling surfaces, and nanozyme. We conclude with a brief perspective on future research directions and on the major challenges in this promising field. Fig. 7 (a) Schematic illustration of anti-EpCAM-coated SiNWA substrate for the enhanced capture of CTCs; (b) schematic illustration of a NanoVelcro chip with SiNWAs integrated in a PDMS fluidic device for capturing CTCs; (c) schematic illustration of an aptamer-coated Nano-Velcro Chip for capturing and releasing CTCs upon enzymatic treatment; (d) schematic illustration of DNA-coated SiNWAs for capturing and releasing T cells (top) and fluorescence microscopy images of captured cells before and after treatment with exonuclease (bottom); (e) and (f) schematic illustration of PNIPAAm-based polymer-coated SiNWAs for capturing and releasing CTCs in response to temperature; (g) schematic illustration of PAAPBA-coated SiNWAs for capturing and releasing CTCs in response to pH and glucose. 91 [Reprinted with permission of ref. 84,

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Section: Patterning Of Sinwasmentioning

confidence: 99%

Vertical SiNWAs for biomedical and biotechnology applications

Liu

2014

J. Mater. Chem. B

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“…By combining catalytic etching and a) Electronic mail: divan@anl.gov nanosphere lithography, large scale fabrication of SiNW arrays with controlled location was demonstrated. 26,27 A commonly reported drawback of the MacEtch technique is the lateral migration of the metal structures during etching, resulting in deformed or totally contorted Si structures. 24 Large areas of high-density SiNW arrays were produced by MacEtch of silicon by using porous anodic aluminum oxide as a patterning mask for the noble metal.…”

Section: Introductionmentioning

confidence: 99%

Metal-assisted etching of silicon molds for electroforming

Divan

Rosenthal

Ogando

et al. 2013

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Articles you may be interested inVertical directionality-controlled metal-assisted chemical etching for ultrahigh aspect ratio nanoscale structures J. Vac. Sci. Technol. B 32, 06FI01 (2014); 10.1116/1.4898199 Influence of catalytic gold and silver metal nanoparticles on structural, optical, and vibrational properties of silicon nanowires synthesized by metal-assisted chemical etching J. Appl. Phys. 112, 073509 (2012); 10.1063/1.4757009Nanofabrication of x-ray zone plates using ultrananocrystalline diamond molds and electroforming Integration of benzocyclobutene polymers and silicon micromachined structures using anisotropic wet etchingIn-plane control of morphology and tunable photoluminescence in porous silicon produced by metal-assisted electroless chemical etching Ordered arrays of high-aspect-ratio micro/nanostructures in semiconductors stirred a huge scientific interest due to their unique one-dimensional physical morphology and the associated electrical, mechanical, chemical, optoelectronic, and thermal properties. Metal-assisted chemical etching enables fabrication of such high aspect ratio Si nanostructures with controlled diameter, shape, length, and packing density, but suffers from structure deformation and shape inconsistency due to uncontrolled migration of noble metal structures during etching. Hereby the authors prove that a Ti adhesion layer helps in stabilizing gold structures, preventing their migration on the wafer surface while not impeding the etching. Based on this finding, the authors demonstrate that the method can be used to fabricate linear Fresnel zone plates.

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“…Actualmente ha crecido el interés por la fabricación y caracterización de nanoestructuras de silicio, entre las que se incluye nanohilos, pilares, tubos, conos y partículas, estas se han estudiado ampliamente debido a sus propiedades físicas y aplicacioneś unicas en el desarrollo nanoelectrónico, nanofotónico, fotovoltaico y optoelectrónico [14,15]. Aunado a esto se ha trabajado la elaboración de múltiples dispositivos como baterías, paneles solares, detectores, sistemas termoeléctricos, sensores químico-biológicos, microfluidos, etc., que utilizan dichas estructuras de silicio [16].…”

Section: Uso Y Diseño De Las Nanoestructuras De Silicio (Nesis)unclassified

“…Existen diversos métodos para generar estas nanoestructuras entre los que se puede mencionar el método de crecimiento vapor-líquido-sólido (VLS), la ablación con láser, la descomposición por evaporación térmica, la deposición de vapor químico, entre otros. Sin embargo, la mayoría de estos requieren largos tiempos de síntesis y altas temperaturas debido a la limitación de su mecanismo de crecimiento [16].…”

Section: Uso Y Diseño De Las Nanoestructuras De Silicio (Nesis)unclassified

“…Durante el calentamiento, la difusión de la interfaz de capas de metal-Si induce la formación de estructuras de Si cristalino a una temperatura inferior a la temperatura de cristalización intrínseca de a-Si, que es de 600 • C, se debe considerar que diferentes tipos de metales pueden inducir diferentes grados de cristalización [14]. el oro (Au) con el tiempo el silicio debajo de esta capa se vuelve cada vez más poroso, y la capa de oro cada vez más frágil [16].…”

Section: Uso Y Diseño De Las Nanoestructuras De Silicio (Nesis)unclassified

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Nanoestructuras De Silicio en Biomedicina Y Biotecnología

Rios¹,

Vega-Baudrit

Villegas³

et al. 2020

Momento

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Silicon nanostructures have properties that make them appealing for applications in biomedicine and biotechnology. The fabrication and characterization of silicon nanostructures are currently gaining a lot of attention and they can include nano-wires, whiskers, pillars, tubes, cones, particles, etc. There are several methods to assist the generation of these nanostructures like laser ablation, thermal evaporation decomposition, and chemical vapor deposition, among others. We consider they are highly potential tools for the improving of diagnosis techniques and the treatment of important biological conditions. The objective of this review is to summarize the main aspects of the physicochemical design of silicon nanomaterials, in addition to toxicological considerations regarding biocompatibility, biodistribution and cell dynamics. Finally, we emphasis on important biomedical applications, such as gene therapy, drug delivery, imaging and sensoring.

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Lithographically patterned silicon nanostructures on silicon substrates

Cited by 10 publications

References 33 publications

Vertical SiNWAs for biomedical and biotechnology applications

Vertical SiNWAs for biomedical and biotechnology applications

Metal-assisted etching of silicon molds for electroforming

Nanoestructuras De Silicio en Biomedicina Y Biotecnología

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