Lithographic Materials

Bargon, Joachim

doi:10.1007/978-1-4684-4847-4_9

Cited by 5 publications

(2 citation statements)

References 68 publications

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“…These works highlight the advantages of o-NBE links in photoresists compared to conventional ones that employed moieties that are unusable at wavelength shorter than 300 nm, such as novolak-quinone diazine [71,76]. Instead, with nitrobenzyl groups, being active to shorter wavelengths, it is possible to reduce light diffraction effect, thus, increasing the definition and resolution of the photoresist [77].…”

Section: Photo-responsive Acrylate and Methacrylate Polymersmentioning

confidence: 99%

“…As a further application, they were able to fabricate a field-effect transistor, in which an organic semiconductor material (pentacene) was patterned on the PEDOT: PSS coating. quinone diazine [71,76]. Instead, with nitrobenzyl groups, being active to shorter wavelengths, it is possible to reduce light diffraction effect, thus, increasing the definition and resolution of the photoresist [77].…”

Section: Photo-responsive Acrylate and Methacrylate Polymersmentioning

confidence: 99%

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Recent Trends in Applying Ortho-Nitrobenzyl Esters for the Design of Photo-Responsive Polymer Networks

et al. 2020

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Polymers with light-responsive groups have gained increased attention in the design of functional materials, as they allow changes in polymers properties, on demand, and simply by light exposure. For the synthesis of polymers and polymer networks with photolabile properties, the introduction o-nitrobenzyl alcohol (o-NB) derivatives as light-responsive chromophores has become a convenient and powerful route. Although o-NB groups were successfully exploited in numerous applications, this review pays particular attention to the studies in which they were included as photo-responsive moieties in thin polymer films and functional polymer coatings. The review is divided into four different sections according to the chemical structure of the polymer networks: (i) acrylate and methacrylate; (ii) thiol-click; (iii) epoxy; and (iv) polydimethylsiloxane. We conclude with an outlook of the present challenges and future perspectives of the versatile and unique features of o-NB chemistry.

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Section: Photo-responsive Acrylate and Methacrylate Polymersmentioning

confidence: 99%

Section: Photo-responsive Acrylate and Methacrylate Polymersmentioning

confidence: 99%

Recent Trends in Applying Ortho-Nitrobenzyl Esters for the Design of Photo-Responsive Polymer Networks

et al. 2020

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Imaging Technology

Winkelmann

Lutz²,

Pai

et al. 2003

Ullmann's Encyclopedia of Industrial Chemistry

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Imaging Technology, 4. Imaging for Electronics

Steppan

Mammato

Stoudt

et al. 2011

Ullmann's Encyclopedia of Industrial Chemistry

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The article contains sections titled: 1. Photoresists 1.1. Industrial Applications of Photoresists 1.2. Function and Chemistry of Photoresists 1.2.1. Positive Photoresists 1.2.2. Negative Photoresists 1.3. Testing Methods 1.4. Economic Aspects and Suppliers of Photoresists 1.5. Occupational Health and Environmental Protection 2. Printed Circuits (Printed Circuit Boards) 2.1. Methods of Producing Printed Circuit Boards 2.2. Masking Techniques 2.2.1. Exposure Masks 2.2.2. Screen Printing 2.2.3. Photoprinting 2.2.4. Other Techniques 2.3. Economic Aspects 2.4. Occupational Health and Environmental Protection 3. Microelectronic Devices 3.1. Integrated Circuit Manufacturing 3.2. Photoprocess 3.3. Techniques for Submicron Lithography

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Lithographic Materials

Cited by 5 publications

References 68 publications

Recent Trends in Applying Ortho-Nitrobenzyl Esters for the Design of Photo-Responsive Polymer Networks

Recent Trends in Applying Ortho-Nitrobenzyl Esters for the Design of Photo-Responsive Polymer Networks

Imaging Technology

Imaging Technology, 4. Imaging for Electronics

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