2015
DOI: 10.1016/j.solmat.2015.07.016
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Light management of a-SiOx:H thin film solar cells with hydrogen-reduced p+ buffer at TiO2/p-layer interface

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Cited by 5 publications
(3 citation statements)
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References 37 publications
(48 reference statements)
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“…Also, in order to obtain high open‐circuit voltage, wide‐bandgap a‐SiO:H that we have developed so far is used for 1st, 2nd, 4th and 5th cells . Low temperature deposited a‐Si:H is used for the 3rd cell.…”
Section: Structure and Fabrication Methods Of Amorphous Si:h Based Quimentioning
confidence: 99%
“…Also, in order to obtain high open‐circuit voltage, wide‐bandgap a‐SiO:H that we have developed so far is used for 1st, 2nd, 4th and 5th cells . Low temperature deposited a‐Si:H is used for the 3rd cell.…”
Section: Structure and Fabrication Methods Of Amorphous Si:h Based Quimentioning
confidence: 99%
“…The a-Si:H=a-Si:H tandem has recently been compared with the a-SiO x :H=a-Si:H double junction by our group. 25) Our experimental results showed that the a-SiO x :H with a wider E opt can achieve a higher V oc than the a-Si:H in the device. Also, the temperature-gradient a-SiO x :H (100 °C)=a-Si:H (150 °C) tandem cell showed a markedly high V oc including better current matching, which resulted in a higher efficiency than the a-Si:H (100 °C)=a-Si:H (150 °C) tandem solar cells.…”
Section: Introductionmentioning
confidence: 63%
“…Our experimental results showed that the a-SiO x :H with a wider E opt can achieve a higher V oc than the a-Si:H in the device. 28) An a-SiO x :H single-junction cell (i layer: 100 nm thick) showed an open circuit voltage (V oc ) of 1.007 V. 29) For the 3rd cell (middle cell), conventional a-Si:H (T sub = 180 °C, E opt = 1.75 eV) is used. The 4th cell and the 5th cell (bottom cell) are the same as the 2nd cell and the 1st cell, respectively.…”
Section: Structure and Preparation Of Solar Cellsmentioning
confidence: 99%