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2015
DOI: 10.7567/jjap.54.08kb02
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Low-temperature-processed a-SiOx:H/a-Si:H tandem cells for full spectrum solar cells

Abstract: We developed wide-bandgap amorphous silicon (a-Si:H) and amorphous silicon oxide (a-SiOx:H) absorbers by extremely decreasing deposition temperature to as low as 100 °C. By adjusting hydrogen and carbon dioxide gas flow rates, device-quality absorbers and thus suitable single junction cells were obtained. An a-SiOx:H single-junction cell (i = 100 nm) fabricated employing the absorber we developed showed an open circuit voltage (Voc) of 1.007 V and a fill factor of 0.741, which are better than those of a-Si:H c… Show more

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Cited by 6 publications
(5 citation statements)
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References 30 publications
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“…Also, in order to obtain high open‐circuit voltage, wide‐bandgap a‐SiO:H that we have developed so far is used for 1st, 2nd, 4th and 5th cells . Low temperature deposited a‐Si:H is used for the 3rd cell.…”
Section: Structure and Fabrication Methods Of Amorphous Si:h Based Quimentioning
confidence: 99%
“…Also, in order to obtain high open‐circuit voltage, wide‐bandgap a‐SiO:H that we have developed so far is used for 1st, 2nd, 4th and 5th cells . Low temperature deposited a‐Si:H is used for the 3rd cell.…”
Section: Structure and Fabrication Methods Of Amorphous Si:h Based Quimentioning
confidence: 99%
“…In this study, we focus on the device simulations of perovskite/HJ c‐Si monolithic tandem solar cells using silicon‐based tunnel recombination junction (TRJ) which consists of doped hydrogenated amorphous silicon (a‐Si:H) and doped hydrogenated microcrystalline silicon oxide (µc‐Si 1− x O x :H). This TRJ layer is free from free carrier absorption and is used in silicon thin‐film tandem solar cells . The simulations were carried out by using AFORS‐HET simulation tool (ver.…”
Section: Introductionmentioning
confidence: 99%
“…12 In an amorphous Si-based multi-junction solar cell, it is possible to continuously deposit all layers on a substrate. Needless to say, a low temperature deposition is essential for preparing a-Si:H based films on polyimide, but our group has already established the deposition technique in the low temperature range of 100-120 C. 13,14 In this paper, a-Si multi-junction solar cells are deposited by using these low-temperature PE-CVD techniques. Although the research and development of CIGS-based solar cell deposition on flexible polyimide substrates is underway, the film substrate temperature is as high as 400 C to 450 C. 15,16 Amorphous Si solar cells can be formed at a lower temperature of 120 C.…”
Section: Introductionmentioning
confidence: 99%