2006
DOI: 10.1103/physrevb.74.140502
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Lattice parameters and thermal expansion of superconducting boron-doped diamonds

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Cited by 58 publications
(34 citation statements)
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“…This has been found to follow the linear interpolation attributed to Vegard as long as the boron content was lower than 0.2 at.% in MPCVD epilayers (Brunet et al 1998;Bustarret et al 2003). Above those threshold concentrations, the expansion is less pronounced (Bustarret et al 2003;Brazhkin et al 2006). This lower expansion rate has been attributed to (i) the contribution of free holes (Bustarret et al 2003), (ii) the negative deformation potentials at the valence band maximum (Brunet et al 1998), and (iii) the occurrence of substitutional boron pairs (Brazhkin et al 2006) that are stabilized by p-type doping (Bourgeois et al 2006).…”
Section: Boron Incorporation At High Concentrationsmentioning
confidence: 89%
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“…This has been found to follow the linear interpolation attributed to Vegard as long as the boron content was lower than 0.2 at.% in MPCVD epilayers (Brunet et al 1998;Bustarret et al 2003). Above those threshold concentrations, the expansion is less pronounced (Bustarret et al 2003;Brazhkin et al 2006). This lower expansion rate has been attributed to (i) the contribution of free holes (Bustarret et al 2003), (ii) the negative deformation potentials at the valence band maximum (Brunet et al 1998), and (iii) the occurrence of substitutional boron pairs (Brazhkin et al 2006) that are stabilized by p-type doping (Bourgeois et al 2006).…”
Section: Boron Incorporation At High Concentrationsmentioning
confidence: 89%
“…Above those threshold concentrations, the expansion is less pronounced (Bustarret et al 2003;Brazhkin et al 2006). This lower expansion rate has been attributed to (i) the contribution of free holes (Bustarret et al 2003), (ii) the negative deformation potentials at the valence band maximum (Brunet et al 1998), and (iii) the occurrence of substitutional boron pairs (Brazhkin et al 2006) that are stabilized by p-type doping (Bourgeois et al 2006). In homoepitaxial films, this expansion is severely limited in the film plane by pseudomorphic growth under compressive biaxial stress, but the boron-induced positive strain along the growth direction is easily detected in the double crystal X-ray diffraction curves (Kačmarčik et al 2005).…”
Section: Boron Incorporation At High Concentrationsmentioning
confidence: 99%
“…The introduction of substitutional boron into diamond leads to an expansion (da/a) of the lattice parameter due to larger covalent radius of boron (r B ¼ 0.088 nm) compared to that of carbon (r C ¼ 0.077 nm); [25][26][27][28] for the maximum B concentration achieved (%7 Â 10 21 at/cm 3 ), the shift of the lattice parameter is about 0.3% (or 0.011Å ). 27 In the case of an isostatic stress, strain is da/a epilayer .…”
mentioning
confidence: 99%
“…27 In the case of an isostatic stress, strain is da/a epilayer . Here, it is assumed that all (i) epilayers are grown coherently on the substrate, i.e., (pseudomorphic growth) without misfit dislocations and (ii) epilayers are much thinner than the substrate, so that strain in the substrates can be neglected.…”
mentioning
confidence: 99%
“…The transitions in two 13 C diamonds are shifted by about 500 mK to lower temperatures compared to two 12 C samples. To extract an isotope effect from this shift of T c , one should take into account the difference in boron doping, which can be calculated from experimentally determined values of the lattice parameters (table 1), and the dependence of T c on the lattice parameter [22]. We estimated T c due to a difference in boron doping as 0.25 K for samples 12 C-10 B and 13 C-10 B and 0.16 K for samples 12 C-11 B and 13 C-11 B.…”
Section: Isotope Effect On T Cmentioning
confidence: 99%