Heavily boron doped diamond epilayers with thicknesses ranging from 40 to less than 2 nm and buried between nominally undoped thicker layers have been grown in two different reactors. Two types of [100]-oriented single crystal diamond substrates were used after being characterized by X-ray white beam topography. The chemical composition and thickness of these so-called delta-doped structures have been studied by secondary ion mass spectrometry, transmission electron microscopy, and spectroscopic ellipsometry. Temperature-dependent Hall effect and four probe resistivity measurements have been performed on mesa-patterned Hall bars. The temperature dependence of the hole sheet carrier density and mobility has been investigated over a broad temperature range (6 K < T < 450 K). Depending on the sample, metallic or non-metallic behavior was observed. A hopping conduction mechanism with an anomalous hopping exponent was detected in the non-metallic samples. All metallic delta-doped layers exhibited the same mobility value, around 3.6 ± 0.8 cm2/Vs, independently of the layer thickness and the substrate type. Comparison with previously published data and theoretical calculations showed that scattering by ionized impurities explained only partially this low common value. None of the delta-layers showed any sign of confinement-induced mobility enhancement, even for thicknesses lower than 2 nm

International audienceDefects induced by boron doping in diamond layers were studied by transmission electron microscopy. The existence of a critical boron doping level above which defects are generated is reported. This level is found to be dependent on the CH 4 /H 2 molar ratios and on growth directions. The critical boron concentration lied in the 6.5–17.0 10 20 at/cm 3 range in the <111> direction and at 3.2 10 21 at/cm 3 for the <001> one. Strain related effects induced by the doping are shown not to be responsible. From the location of dislocations and their Burger vectors, a model is proposed, together with their generation mechanism

To develop further diamond related devices, the concentration and spatial location of dopants should be controlled down to the nanometer scale. Scanning transmission electron microscopy using the high angle annular dark field mode is shown to be sensitive to boron doping in diamond epilayers. An analytical procedure is described, whereby local boron concentrations above 1020 cm−3 were quantitatively derived down to nanometer resolution from the signal dependence on thickness and boron content. Experimental boron local doping profiles measured on diamond p−/p++/p− multilayers are compared to macroscopic profiles obtained by secondary ion mass spectrometry, avoiding reported artefacts.

International audienceHeavy boron-doping layer in diamond can be responsible for the generation of extended defects during the growth processes (Blank et al., Diam. Relat. Mater. 17, 1840 (2008) [1]). As claimed recently (Alegre et al., Appl. Phys. Lett. 105, 173103 (2014) [2]), boron pair interactions rather than strain-related misfit seems to be responsible for such dislocation generation. In the present work, electron microscopy observations are used to study the defects induced by heavy boron doping in different growth plane orientations. Facets of pyramidal Hillocks (PHs) and pits provide access to non-conventional growth orientations where boron atoms incorporation is different during growth. TEM analysis on FIB prepared lamellas confirm that also for those growth orientations, the generation of dislocations occurs within the heavily boron-doped diamond layers. Stacking faults (SFs) have been also observed by high resolution transmission electron microscopy (HREM). From the invisibility criteria, using weak beam (WB) observation, ½ [1-10] and 1/6 [11-2], Burger vectors have been identified. Their generation behavior confirms the mechanism reported by Alegre et al. where local in-plane strain effects induced at the growing surface of the diamond lattice by the neighboring of several boron atoms cause the generation of such extended defects

The capability of transmission electron microscopy (TEM) using the high angle annular dark field mode (HAADF, also labelled Z-contrast) to quantify boron concentration, in the high doping range between 10 19 cm − 3 and 10 21 cm − 3 , is demonstrated. Thanks to the large relative variation of atomic number Z between carbon and boron, doping concentration maps and profiles are obtained with a nanometer-scale resolution. A novel numerical simulation procedure allows the boron concentration quantification and demonstrates the high sensitivity and spatial resolution of the technique.Crown