2003
DOI: 10.1117/12.479234
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Laser processing of ceramic and crystalline wafer substrates for microelectronic applications

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Cited by 4 publications
(2 citation statements)
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“…For AlN the acquired bore-hole is more constant in diameter, the maximum drilling depth reaches 15.8 mm at an aspect ratio of 1:175. Influence of beam quality To determine the influence of laser beam quality in high aspect laser micro drilling, comparative drilling studies into AlN and Al 2 O 3 using a non-commercial 100 W double-rod Nd:YAG laser system (LMTB) [6] and [7]in multimode configuration were conducted. The MOPA-system achieves significant deeper and leaner holes at identical laser parameters, except for the difference in beam quality, which lies one order of magnitude apart (MOPA: M² = 2.3; double-rod: M² = 20.5).…”
Section: Proc Of Spie Vol 4977 299mentioning
confidence: 99%
“…For AlN the acquired bore-hole is more constant in diameter, the maximum drilling depth reaches 15.8 mm at an aspect ratio of 1:175. Influence of beam quality To determine the influence of laser beam quality in high aspect laser micro drilling, comparative drilling studies into AlN and Al 2 O 3 using a non-commercial 100 W double-rod Nd:YAG laser system (LMTB) [6] and [7]in multimode configuration were conducted. The MOPA-system achieves significant deeper and leaner holes at identical laser parameters, except for the difference in beam quality, which lies one order of magnitude apart (MOPA: M² = 2.3; double-rod: M² = 20.5).…”
Section: Proc Of Spie Vol 4977 299mentioning
confidence: 99%
“…Structuring of ITO films has a great impetus from industrial applications. Accordingly, laser patterning of ITO thin films on glass substrates has been extensively studied with various pulsed laser sources [22][23][24][25][26][27][28][29][30][31][32][33][34][35][36]. However, a detailed study of the incubation behavior of ITO films and its influence on laser patterning has not yet been reported.…”
mentioning
confidence: 99%