2011
DOI: 10.1021/jp204427j
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Laser-Induced Reversible and Irreversible Changes in Silicon Nanostructures: One- and Multi-Phonon Raman Scattering Study

Abstract: Reversible/irreversible changes in the Raman spectra of mesoporous silicon (meso-PSi) induced by laser heating were investigated. It is shown that whereas identical Raman spectra of single crystalline silicon can be obtained at different laser irradiances, these spectra change significantly in both reversible and irreversible ways in silicon nanostructures such as porous silicon (PSi). Whereas band shift and broadening in first- and second-order scattering were found to be reversible, surface phonon scattering… Show more

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Cited by 12 publications
(6 citation statements)
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“…To shed light on the catalytic mechanism, we employed in situ Raman spectroscopy to monitor the progress of the reaction. As shown in Figure A, the Raman spectra of H-SiNWAs in either air or water showed an obvious band at 2110 cm –1 corresponding to Si–H vibrations. Upon addition of H 2 O 2 , the band was red shifted to 2060 cm –1 , which we attributed to the formation of (Si–H) 2 ···(O species) ((Si–H) 2 ···Os, possibly as (Si–H) 2 ··· 2 O 2 H) when Si–H bonds react with H 2 O 2 . The formation of (Si–H) 2 ···O structures weakened the relative intensity of the Si–H band, causing the red shift.…”
Section: Resultsmentioning
confidence: 92%
“…To shed light on the catalytic mechanism, we employed in situ Raman spectroscopy to monitor the progress of the reaction. As shown in Figure A, the Raman spectra of H-SiNWAs in either air or water showed an obvious band at 2110 cm –1 corresponding to Si–H vibrations. Upon addition of H 2 O 2 , the band was red shifted to 2060 cm –1 , which we attributed to the formation of (Si–H) 2 ···(O species) ((Si–H) 2 ···Os, possibly as (Si–H) 2 ··· 2 O 2 H) when Si–H bonds react with H 2 O 2 . The formation of (Si–H) 2 ···O structures weakened the relative intensity of the Si–H band, causing the red shift.…”
Section: Resultsmentioning
confidence: 92%
“…Figure (a) shows that several multi‐phonon bands are present in the Si NWs/NCs samples (290–300, 620–640, and 950–970 cm −1 ), which are not detected in the bulk Si Raman spectrum. These bands are mostly due to the amorphous Si, Si NC embedded in SiO x matrix, or the surface chemical bonds (such as Si–H) . Note that the band corresponding to the first‐order Raman mode in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…These bands are mostly due to the amorphous Si, Si NC embedded in SiO x matrix, or the surface chemical bonds (such as Si-H). [22][23][24] Note that the band corresponding to the first-order Raman mode in Fig. 2(a) is extended down to~410 cm À1 , which suggest that the Si NCs are covered by a thin layer of amorphous Si.…”
Section: Raman Analysismentioning
confidence: 99%
“…Raman spectra, shown in Figure (d), are recorded to check the presence of the O i symmetric stretching of A 1 g symmetry around 600 cm –1 , which is only Raman active. The spectra show bands which are characteristic of (multi)phonons in silicon at 978, 942, 521, and 300 cm –1 . The bands at 821 and 677 cm –1 have been assigned to SiO 2 network vibrations and a Si–O stretching mode, respectively.…”
Section: Resultsmentioning
confidence: 99%