Laser-Focused Atomic Deposition for Nanascale Grating

Ma, Yan; Li, Tongbao; Wu, Wen; Xiao, Yili; Zhang, Pingping; Gong, Wenping

doi:10.1088/0256-307x/28/7/073202

Cited by 10 publications

(6 citation statements)

References 17 publications

(19 reference statements)

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“…The most obvious advantage of LFAD is the self-traceability of nano-grating pitch to a natural constant, which produces a series of characteristics, such as uniformity, homogeneity, and consistency. [2] Since the invention of Cr atom lithography in 1992, [3,4] a series of different working elements have been demonstrated successfully, such as Cr, [5,6] Al, [7] Yb, [8] and Fe. [9] Nowadays, the LFAD technology has even shown the ability of inventing natural square rulers at nanoscale, [10] which opens a new way for fabricating angle standards precisely.…”

Section: Introductionmentioning

confidence: 99%

Optimization of laser focused atomic deposition by channeling*

Chen¹,

Liu²,

Zhu³

et al. 2020

Chinese Phys. B

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Laser focused atomic deposition is a unique and effective way to fabricate highly accurate pitch standards in nanometrology. However, the stability and repeatability of the atom lithography fabrication process remains a challenging problem for massive production. Based on the atom–light interaction theory, channeling is utilized to improve the stability and repeatability. From the comparison of three kinds of atom–light interaction models, the optimal parameters for channeling are obtained based on simulation. According to the experimental observations, the peak to valley height of Cr nano-gratings keeps stable when the cutting proportion changes from 15% to 50%, which means that the channeling shows up under this condition. The channeling proves to be an effective method to optimize the stability and repeatability of laser focused Cr atomic deposition.

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Section: Introductionmentioning

confidence: 99%

Optimization of laser focused atomic deposition by channeling*

Chen¹,

Liu²,

Zhu³

et al. 2020

Chinese Phys. B

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“…[6] In our group, a pitch standard of 213-nm spatial period has been fabricated using the atom lithography. [7] The broadening of Cr nanostructures has been studied. [8] Other relevant work covers the influence of the divergence angle on deposition of neutral atoms [9] and one-dimensional (1D) collimation of the chromium beam.…”

Section: Introductionmentioning

confidence: 99%

Structured mirror array for two-dimensional collimation of a chromium beam in atom lithography

Ma¹,

Li²,

Zhang³

et al. 2013

Chinese Phys. B

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Direct-write atom lithography, one of the potential nanofabrication techniques, is restricted by some difficulties in producing optical masks for the deposition of complex structures. In order to make further progress, a structured mirror array is developed to transversely collimate the chromium atomic beam in two dimensions. The best collimation is obtained when the laser red detunes by natural line-width of transition 7 S 3 → 7 P 0 4 of the chromium atom. The collimation ratio is 0.45 vertically (in x axis), and it is 0.55 horizontally (in y axis). The theoretical model is also simulated, and success of our structured mirror array is achieved.

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“…The pixel density of a 10 nm/pixel and a scan speed of 0.001 mm/s are set for restoring the profile of the grating. [11] One of the deposition grating profiles, the detailed structure with a 20 µm scan length and 3D reconstruction covering a 20 µm × 20µm area, is shown in Figs. 4(a The repeatability measurements are carried out at the same area by the metrological AFM.…”

mentioning

confidence: 99%

Nano-Traceability Study of a Cr Standard Grating Fabricated by Laser-Focused Atomic Deposition

Lei¹,

Li²,

Fan³

et al. 2014

Chinese Phys. Lett.

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A dimensional artifact is developed, which is a chromium (Cr) deposition grating fabricated by a laser-focused atomic deposition technique. The mean pitch of the grating is measured by using a metrological atomic force microscope with a large range, where a series of reference signs have been performed to locate the deposition area. Cosine error of the measurement result is analyzed and eliminated by the iterative angle calibration. The measurement result shows that the mean pitch of the grating is 212.66 ± 0.02 nm, which is very close to half of the standing laser wavelength (𝜆 = 425.55 nm). This means that the grating has traceability with high accuracy and can substitute the laser interference technology for instrument calibration. Moreover, using the Cr deposition grating as a nano standard can shorten the traceability chain and improve the practical application.

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Laser-Focused Atomic Deposition for Nanascale Grating

Cited by 10 publications

References 17 publications

Optimization of laser focused atomic deposition by channeling*

Optimization of laser focused atomic deposition by channeling*

Structured mirror array for two-dimensional collimation of a chromium beam in atom lithography

Nano-Traceability Study of a Cr Standard Grating Fabricated by Laser-Focused Atomic Deposition

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