Langmuir probe measurements of a radio frequency induction plasma

Hopwood, Jeffrey; Guarnieri, C. R.; Whitehair, S. J.; Cuomo, J.J.

doi:10.1116/1.578282

Cited by 280 publications

(127 citation statements)

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“…In this case, this ratio was 1.12 and 1.11 for the microstrip and stripline devices, respectively. Hence, an RF influence on T e cannot be excluded, and the reported values should therefore be regarded as an upper bound to the actual electron temperature [20].…”

Section: Discussionmentioning

confidence: 99%

Evaluation of a microplasma source based on a stripline split-ring resonator

Berglund¹,

Grudén²,

Thornell³

et al. 2013

Plasma Sources Sci. Technol.

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Abstract. In this paper, a stripline split-ring resonator microwave-induced plasma source, aimed for integration in complex systems, is presented and compared with a traditional microstrip design. Devices based on the two designs are evaluated using a plasma breakdown test setup for measuring the power required to ignite plasmas at different pressures. Moreover, the radiation efficiency of the devices is investigated with a Wheeler cap, and their electromagnetic compatibility is investigated in a variable electrical environment emulating an application. Finally, the basic properties of the plasma in the two designs are investigated in terms of electron temperature, plasma potential, and ion density. The study shows that, with a minor increase in plasma ignition power, the stripline design provides a more isolated and easy-to-integrate alternative to the conventional microstrip design. Moreover, the stripline devices showed a decreased antenna efficiency as compared to their microstrip counterparts, which is beneficial for plasma sources. Furthermore, the investigated stripline devices exhibited virtually no frequency shift in a varying electromagnetic environment, whereas the resonance frequency of their microstrip counterparts shifted up to 17.5%. With regards to the plasma parameters, the different designs showed only minor differences in electron temperature, whereas the ion density was higher with the stripline design.Keywords: Split-ring resonator, Microwave plasma, Microstrip, Stripline, Plasma, Wheeler cap, Langmuir probe

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Section: Discussionmentioning

confidence: 99%

Evaluation of a microplasma source based on a stripline split-ring resonator

Berglund¹,

Grudén²,

Thornell³

et al. 2013

Plasma Sources Sci. Technol.

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show abstract

“…It decreases as the pressure increases. It is well-known that lower plasma potential and lower electron temperature are desirable in etching processes [2]. In this sense, higher gas pressure appears to be recommendable.…”

Section: A Argon Plasmamentioning

confidence: 99%

Measurement of plasma parameters in an inductively coupled plasma reactor

Sasaki¹,

Nanbu²,

Takahashi³

2001

AIP Conference Proceedings

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Abstract. The objective is to deepen the understanding of basic plasma properties in a high-density inductively coupled plasma(ICP) reactor. The experiment using a Langmuir probe, which is made of tungsten wire having length of 2.3 mm and diameter of 0.65 mm, is carried out to determine the characteristics of argon plasma. The axial and radial distributions of the plasma density, electron temperature, and plasma potential are measured. It was found that the electron density is in the range of 1.0 x 10 10 to 1.0 x 10 11 cm -3 , electron temperature 4 ~ 6 eV, and plasma potential 35 ~ 45 V, respectively. These plasma parameters are spatially nonuniform in the axial direction; they depend on the distance between the plasma source and the measuring point. Next, etching of polycristalline silicon wafer by chlorine plasma is studied. The results obtained in this study indicate the effects of rf coil power, gas pressure, and substrate rf bias power on the distributions of the etch rate.

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“…Such sources can produce a high-density, uniform plasma in a low pressure gas without the need for external magnetic fields [1,2,3,4,5].…”

Section: Introductionmentioning

confidence: 99%

Effect of electron energy distribution function on power deposition and plasma density in an inductively coupled discharge at very low pressures

Ramamurthi

Economou

Kaganovich

2003

Plasma Sources Sci. Technol.

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A self-consistent 1-D model was developed to study the effect of the electron energy distribution function (EEDF) on power deposition and plasma density profiles in a planar inductively coupled plasma (ICP) in the non-local regime (pressure ≤ 10 mTorr). The model consisted of three modules: (1) an electron energy distribution function (EEDF) module to compute the non-Maxwellian EEDF, (2) a non-local electron kinetics module to predict the non-local electron conductivity, RF current, electric field and power deposition profiles in the non-uniform plasma, and (3) a heavy species transport module to solve for the ion density and velocity profiles as well as the metastable density. Results using the non-Maxwellian EEDF model were compared with predictions using a Maxwellian EEDF, under otherwise identical conditions. The RF electric field, current, and power deposition profiles were different, especially at 1mTorr, for which the electron effective mean free path was larger than the skin depth. The plasma density predicted by the Maxwellian EEDF was up to 93% larger for the conditions examined. Thus, the non-Maxwellian EEDF must be accounted for in modeling ICPs at very low pressures.

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Langmuir probe measurements of a radio frequency induction plasma

Cited by 280 publications

References 0 publications

Evaluation of a microplasma source based on a stripline split-ring resonator

Evaluation of a microplasma source based on a stripline split-ring resonator

Measurement of plasma parameters in an inductively coupled plasma reactor

Effect of electron energy distribution function on power deposition and plasma density in an inductively coupled discharge at very low pressures

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