The kinetics of growth of an oxide film on Zr electrode under open circuit conditions in K1 solutions were investigated using potential and impedance measurements. The effect of some parameters such as surface pre-treatment, concentration and salt type, including alkali halide anions, on the reactivity of the oxide growth process were studied. In all cases the potential, capacitance and resistance were followed with time, and the oxide film was found to thicken continuously.The iodide ion is assumed to participate in enhancing the formation of species which inhibits partially the growth of oxide film on Zr surface. The impedance diagrams of the oxide film/electrolyte interface is an almost capacitative one, with an impeded charge transfer reaction.