1999
DOI: 10.1063/1.371003
|View full text |Cite
|
Sign up to set email alerts
|

Isotropic dielectric functions of highly disordered AlxGa1−xInP (0⩽x⩽1) lattice matched to GaAs

Abstract: Determination of the complex dielectric function and the critical-point energies of (Al x Ga 1Ϫx) 0.51 In 0.49 P, over the full range of composition x and for photon energies E from 0.75 to 5 eV is reported from variable angle of incidence spectroscopic ellipsometry. Native-oxide effects on the (Al x Ga 1Ϫx) 0.51 In 0.49 P optical functions are removed numerically. The highly disordered state of the metalorganic vapor-phase epitaxy grown samples is analyzed by transmission electron microscopy. Optical anisotro… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

1
34
0

Year Published

2000
2000
2020
2020

Publication Types

Select...
3
3
1

Relationship

2
5

Authors

Journals

citations
Cited by 54 publications
(35 citation statements)
references
References 38 publications
1
34
0
Order By: Relevance
“…Using the recently published room temperature data from Ref. [10] as a starting point, we analysed quantitatively the reflectance transients taken during growth of different RT-lattice matched AlGaInP layers for establishing a high temperature database of the optical constants n and k. The dependence of these constants on the aluminium content is shown in Fig. 4a and b for a growth temperature of 700 1C at two wavelengths (l ¼ 563 nm (2.2 eV) and 950 nm (1.30 eV)).…”
Section: Determination Of Aluminium Content and Growth Ratementioning
confidence: 99%
See 1 more Smart Citation
“…Using the recently published room temperature data from Ref. [10] as a starting point, we analysed quantitatively the reflectance transients taken during growth of different RT-lattice matched AlGaInP layers for establishing a high temperature database of the optical constants n and k. The dependence of these constants on the aluminium content is shown in Fig. 4a and b for a growth temperature of 700 1C at two wavelengths (l ¼ 563 nm (2.2 eV) and 950 nm (1.30 eV)).…”
Section: Determination Of Aluminium Content and Growth Ratementioning
confidence: 99%
“…These are of importance both for quantitative analysis of curvature measurements and for an in situ determination of the aluminium content x of the lattice matched AlGaInP layers. For this purpose we established a high-temperature database for the AlGaInP optical constants derived from recently published room temperature (RT) data [10] and in situ measured transients in the UV-vis range. This database is applied for an in-situ determination of the growth rate and the aluminium composition.…”
Section: Introductionmentioning
confidence: 99%
“…45 are often utilized. 43,46 Separate MDFs are employed in this work for the tantalum oxide IR and NIR-VUV dielectric function spectra, respectively. For the NIR-VUV data a general parametric functional model based on the Kim and Garland approach [47][48][49] is used to describe and fit ⑀ Ta for amorphous tantalum oxide.…”
Section: Theorymentioning
confidence: 99%
“…3 Results and discussion Figure 1 shows experimental and best-fit calculated data in the pseudodielectric function hei representation, [6] where only the real part he 1 i is included for brevity. An isotropic five-phase model (substrate/AlN buffer/GaN buffer/SL/ambient) was used, where the SL was treated as homogeneous layer with thickness according to growth parameters, and all other thickness values were allowed to vary during the best-fit calculation.…”
mentioning
confidence: 99%
“…1 as well. The same MDF approach, as described in [6], was then used to obtain e for the SL layer. The MDF comprised contributions from two M 0 -type band-to-band transitions, static dielectric polarizability, and an undamped harmonic oscillator (pole) to account for higher energy transitions outside the studied spectral range.…”
mentioning
confidence: 99%