Iron disilicide formed in a-Si〈Fe〉 thin films by magnetron co-sputtering

Kudoyarova, V. Kh.; Теруков, Е. И.; Kon’kov, O. I.; Gusev, O. B.; Davydov, V. Yu.; Mosina, G. N.

doi:10.1016/j.physb.2003.09.200

Cited by 3 publications

(1 citation statement)

References 10 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Generally, the thin-film composition relates to the sputtering atoms ratio in magnetron sputtering process. The sputtering atoms ratio is related to the threshold energy of target element and sputtering power [8][9][10]. The homogeneity of thin-film is connected to the rotating velocity of substrate.…”

Section: Introductionmentioning

confidence: 99%

Microstructure and Electrical Properties of Nano Ni-Cr Thin-Films Fabricated by Magnetron Co-Sputtering Techniques

Zhou

Yan

2007

MSF

View full text Add to dashboard Cite

The nano Ni-Cr thin-film samples with different composition have been fabricated by a double-target magnetron co-sputtering equipment, through controlling the sputtering power, the substrate rotate speed, and the substrate temperature, The results showed that the grains sizes with polycrystalline microstructure were not greater than 10 nm. The crystal microstructure of Ni-Cr thin-films is Face Centered Cubic (FCC). The dominant texture in the Ni-Cr film was Ni (111) under this sputtering condition. The lattice parameters of Ni crystal and the inter-planar distances of Ni (111) increased by Cr solid-soluble in Ni crystal. The surface morphology of the thin-film samples is smooth and compact. The TCR (temperature coefficient of resistance) value of specimen 3 was 84~130 ppm/k, which show the specimen 3 was the most stable.

show abstract

Section: Introductionmentioning

confidence: 99%