Ion Projection Lithography: Progress of European MEDEA &amp; International Program

Kaesmaier, Rainer; Löschner, H.

doi:10.1016/s0167-9317(00)00263-x

Cited by 15 publications

(6 citation statements)

References 14 publications

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“…However, the ion optics still remains as a major challenge since an entire image has to be projected with minimum distortion and focused over the entire field at the same time. Moreover, the new development and the latest applications of the ion beam projection technology have been thoroughly reviewed recently (Melngailis et al 1998, Kaesmaier andLoschner 2000). Thus, in this review, only the milling technology will be examined.…”

Section: Introductionmentioning

confidence: 99%

Recent developments in micromilling using focused ion beam technology

Tseng

2004

J. Micromech. Microeng.

363

223

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The application of focused ion beam (FIB) technology in microfabrication has become increasingly popular. Its use in microfabrication has advantages over contemporary photolithography or other micromachining technologies, such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. An overview of the recent development in FIB microfabrication technology is given. The emphasis will be on direct milling, or maskless techniques, and this can distinguish the FIB technology from the contemporary photolithography process and provide a vital alternative to it. After an introduction to the technology and its FIB principles, the recent developments in using milling techniques for making various high-quality devices and high-precision components at the micrometer scale are examined and discussed. Finally, conclusions are presented to summarize the reviewed work and to suggest the areas for improving the FIB milling technology and for future research.

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Section: Introductionmentioning

confidence: 99%

Recent developments in micromilling using focused ion beam technology

Tseng

2004

J. Micromech. Microeng.

363

223

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“…A new look at previously obtained experimental results and simulation models applicable in IBL is a necessary task due to the progress in the development of IBL tools (Kaesmaier & Löschner, 2000) and their applications concerning exposure of one-component resist PMMA (Miller, 1989;Mladenov et al, 2001) as well as multi-component resists including chemically amplified resists (CARs) (Hirscher et al, 2001). The simulation tools for sub-150 nm ion beam lithography require more adequate models of the ion scattering, the energy losses and the development process.…”

Section: Exposure Process Simulation At Ion Beam Lithography (Ibl)mentioning

confidence: 99%

Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 1: Exposure Modeling at Electron and Ion Beam Lithography

Vutova¹,

Mladenov²

2010

Lithography

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“…This is the most promising technique among the three and has been extensively investigated over the past few decades. [99][100][101][102][103] In studies similar to those been done in X-ray lithography, [78,79] Murase and coworkers compared the e-beam and ion-beam sensitivities of a variety of resists. [104] A strong correlation was found for both positive and negative systems when compared with the results from X-ray lithography.…”

Section: Ion-beam Lithographymentioning

confidence: 99%

The convergence of top-down and bottom-up nanofabrication: formation of 3D structures

Yang

Dai

et al. 2005

SPIE Proceedings

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Lithography and the processes associated with it are the backbone of the nanotechnology revolution. Several developments are occurring simultaneously: a drive to reduce minimum feature size leading to advances in microelectronics, the use of lithographically patterned structures to prepare devices for photonics, biotechnology and other forms of nanotechnology and finally the drive to create three-dimensional (3D) structures for device and new materials creation. Thus the controlled formation of nanometer scale structures in two and three dimensions is of increasing interest in many applications. This paper will overview new approaches for the construction of small-scale structures using methods generally considered as next generation lithography. New approaches derived from two photon processes for the formation of complex images and the development of patterned structures will be described. Finally in the production of 3D patterns, the possible role of self-assembly coupled to lithography will be examined. Photodefinable block copolymers with erodable microstructures have been successfully used to form mesoporous materials and will be discussed.

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Ion Projection Lithography: Progress of European MEDEA & International Program

Cited by 15 publications

References 14 publications

Recent developments in micromilling using focused ion beam technology

Recent developments in micromilling using focused ion beam technology

Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 1: Exposure Modeling at Electron and Ion Beam Lithography

The convergence of top-down and bottom-up nanofabrication: formation of 3D structures

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