Ion etching of thin W layers: enhanced reflectivity of W-C multilayer coatings

Puik, E. J.; Wiel, M.J. van der; Zeijlemaker, H.; Verhoeven, J.

doi:10.1016/0169-4332(91)90103-q

Cited by 30 publications

(9 citation statements)

References 9 publications

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“…Nevertheless, the high chemical stability of carbide as well as pure carbon will result in a low chemical reactivity at interfaces with other materials. This prevents intermixing but can be the cause that other materials grow with a high surface roughness due to initial island formation [21,22].…”

Section: Resultsmentioning

confidence: 98%

Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions

et al. 2006

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Section: Resultsmentioning

confidence: 98%

Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions

et al. 2006

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“…It is well known that the roughness of these films usually oscillates during the deposition, with one of the components, usually the spacer layer, having a smoothing, the other a roughening action [17][18][19][20][21][22]. Making the smoothing film (the C or Si layer) thicker and the roughening film thinner could result in more efficient smoothing of the substrate and has still to be investigated.…”

Section: Discussionmentioning

confidence: 99%

“…The substrates of Table 1 were coated with multilayers by electron beam evaporation with in-situ reflectivity monitoring and ion-beam polishing [17][18][19][20][21][22]. Most of the mirrors on these substrates are Mo/Si with periods around 7 nm.…”

Section: Multilayer Deposition and Characterizationmentioning

confidence: 99%

<title>Smoothing of mirror substrates by thin-film deposition</title>

et al. 1999

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L a w r e n c e L i v e r m o r e N a t i o n a l L a b o r a t o r y UCRL-JC-135146 Smoothing of Mirror Substrates by Thin-Film DepositionE. Spiller S. Baker E. Parra C. Tarrio August 3, 1999This is a preprint of a paper intended for publication in a journal or proceedings. Since changes may be made before publication, this preprint is made available with the understanding that it will not be cited or reproduced without the permission of the author. PREPRINT ABSTRACTSuperpolished optical flats with high spatial frequency roughness below 0.1 nm have been commercially available for years. However, it is much more difficult to obtain figured optics of similar quality. We have obtained and tested the finish of figured optics from different vendors by atomic force microscopy and optical profilometry and have investigated how the substrate quality can be improved by the deposition of thin films. We have determined the growth parameters of several thin-film structures. From these parameters we can determine how the surface topography of a coated mirror differs from that of the substrate, select the best thin-film structure, and predict the possible improvement.

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“…Post deposition grazing incidence ion irradiation has also proven to smoothen the layers leading to significant improved reflectivities. 17,18 Also other effects such as resputtering and defect creation have been observed. 19 It is expected that an increased flux of ions with lower energy would counteract for the intermixing, while the positive effects of the enhanced ad-atom mobility is subsistent.…”

Section: Introductionmentioning

confidence: 96%

<title>Enhanced soft x-ray reflectivity of Cr/Sc multilayers by ion-assisted sputter deposition</title>

et al. 2001

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Cr/Sc multilayers have been grown on Si substrates using DC magnetron sputtering. The multilayers are intended as condenser mirrors in a soft x-ray microscope operating at the wavelength 3.374 nm. They were designed for normal reflection of the first and second order with multilayer periods of 1.692 nm and 3.381 nm, and layer thickness ratios of 0.471 and 0.237, respectively. At-wavelength soft x-ray reflectivity measurements were carried out using a reflectometer with a compact soft x-ray laser-plasma source. The multilayers were irradiated during growth with Ar ions, varying both in energy (9-113 eV) and flux, in order to stimulate the ad-atom mobility and improve the interface flatness. It was found that to obtain a maximum soft x-ray reflectivity with a low flux (Cr=0.76, Sc=2.5) of Ar ions a rather high energy of 53 eV was required. Such energy also caused intermixing of the layers. By the use of a solenoid surrounding the substrate, the arriving ion-to-metal flux ratio could be increased 10 times and the ion energy could be decreased. A high flux (Cr=7.1, Sc=23.1) of low energy (9 eV) Ar ions founded the most favourable growth condition in order to limit the intermixing with a subsistent surface flatness.

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Ion etching of thin W layers: enhanced reflectivity of W-C multilayer coatings

Cited by 30 publications

References 9 publications

Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions

Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions

<title>Smoothing of mirror substrates by thin-film deposition</title>

<title>Enhanced soft x-ray reflectivity of Cr/Sc multilayers by ion-assisted sputter deposition</title>

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