2016
DOI: 10.1149/07204.0065ecst
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(Invited) Intrinsic Reliability Assessment of 650V Rated AlGaN/GaN Based Power Devices: An Industry Perspective

Abstract: University of Bristol -Explore Bristol Research General rightsThis document is made available in accordance with publisher policies. Please cite only the published version using the reference above. Full terms of use are available:

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Cited by 25 publications
(11 citation statements)
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“…8b), associated with vertical and lateral current flow within the GaN:C layer. Two time constants that are consistent with this predicted behavior have been observed experimentally [25,26]. And for (D) the lower vertical resistivity through the UID-GaN layer results in the GaN:C staying pinned to the local 2DEG potential.…”
Section: Drain Bias Dependence Of Dynamic Ronsupporting
confidence: 75%
See 1 more Smart Citation
“…8b), associated with vertical and lateral current flow within the GaN:C layer. Two time constants that are consistent with this predicted behavior have been observed experimentally [25,26]. And for (D) the lower vertical resistivity through the UID-GaN layer results in the GaN:C staying pinned to the local 2DEG potential.…”
Section: Drain Bias Dependence Of Dynamic Ronsupporting
confidence: 75%
“…Fig. 4a shows a substrate ramp experiment for a high quality layer structure measured at ramp rates of 1 and 28 V/s corresponding to displacement currents of ~2 and ~60nA/cm 2 [25,26]. Fig.…”
Section: A Vertical Transportmentioning
confidence: 99%
“…2(a) is more complex, however, above 100°C it is consistent with the simulation, with GaN transport dominated by bulk resistive conduction via holes thermally activated to the VB, thus explaining the observed 0.9-eV activation energy. We note that two time constants (and hence apparent capture cross sections) from the same trap has previously been observed in related measurements and simulations for a p-type floating buffer [30], although in that case both contributions had the same sign. Below 100°C, the GaN buffer is more resistive and the behavior would be consistent with the hopping transport between the 2DEG and acceptors dominating, perhaps explaining the widely observed 0.5-0.6-eV activation energy [12], [14], [31].…”
Section: Fig 4 Vertical Electrical Field Component For the Buffers Ofsupporting
confidence: 74%
“…After the substrate stress, there are two discharging paths as depicted in figure 7(b). The first path is vertical current flow leading to recombination between the positive and negative charges within the carbon doped GaN layer [16,17]. The second path is the same as the mechanism disccussed for ON-state stress, as the remaining negative charges spread laterally and flow to the contacts.…”
Section: Charge Trappingmentioning
confidence: 98%