2015
DOI: 10.1016/j.tsf.2015.07.074
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Investigation of growth and characterization of nanostructured CuIn5S8 thin films produced by glancing angle deposition

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Cited by 14 publications
(4 citation statements)
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References 45 publications
(19 reference statements)
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“…One can site the gas sensors as an example. Moreover, by governing the freedom's degrees of the substrate, it is possible to perform several shapes by the GLAD technique, such as vertical columns [5], helical [6], zigzag shapes [7], U-shaped resonators [8], and even three-armed square nanospirals [9] .…”
Section: Introductionmentioning
confidence: 99%
“…One can site the gas sensors as an example. Moreover, by governing the freedom's degrees of the substrate, it is possible to perform several shapes by the GLAD technique, such as vertical columns [5], helical [6], zigzag shapes [7], U-shaped resonators [8], and even three-armed square nanospirals [9] .…”
Section: Introductionmentioning
confidence: 99%
“…This ternary semiconductors family due to their flexibility in electrical and optical properties can be used as photo‐absorbing materials in optoelectronic devices 9 . It was investigated in References 10–13 that these semiconductors having suitable band gaps matching with solar spectrum, are considered to be an ideal choice for photo‐electrochemical and photovoltaic cells due to its high absorption coefficient and good photo‐stability 14 …”
Section: Introductionmentioning
confidence: 99%
“…9 It was investigated in References 10-13 that these semiconductors having suitable band gaps matching with solar spectrum, are considered to be an ideal choice for photo-electrochemical and photovoltaic cells due to its high absorption coefficient and good photo-stability. 14 The ternary semi-conductor family AB 5 C 8 (A = Cu or Ag, B = In and C = S, Se or Te) is one of the most important representative among the ternary semi-conductors. These ternary semiconductors are mostly visible-light active materials which have recently gained significant interest due to appropriate band gaps, high absorption coefficients, inter-conversion between P-and N-type carrier types as well as in manufacturing of comparatively cheap homo and hetero junction structures.…”
Section: Introductionmentioning
confidence: 99%
“…This technique is a physical vapor deposition (PVD) process that is implemented by oblique angle deposition and/or substrate rotation in front of the deposition source to control the column orientation and porosity of nanostructured films [3,4]. The GLAD technique has been shown to be capable of thin films elaboration with a wide variety of microstructures, such as vertical columns [5], helical [6], and zigzag shapes [7], which is hardly obtained from the normal incidence vapor deposition [8].…”
Section: Introductionmentioning
confidence: 99%