2008
DOI: 10.1016/j.jallcom.2007.09.011
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Investigation of DC conductivity and switching phenomenon of Se80Te20−xGex amorphous system

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Cited by 28 publications
(17 citation statements)
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“…This is because the density of lattice defects as vacancies, interstitials and dislocations, develops during the deposition of thin film, decreases with the increase of film thickness. Thus, the film resistance decreases while the conductivity increases with the increase of film thickness [18]. According to Mott and Davis [19], the activation energy alone does not provide any indication to whether conduction takes place in extended state above the mobility edge or by hopping in the localized state.…”
Section: Resultsmentioning
confidence: 99%
“…This is because the density of lattice defects as vacancies, interstitials and dislocations, develops during the deposition of thin film, decreases with the increase of film thickness. Thus, the film resistance decreases while the conductivity increases with the increase of film thickness [18]. According to Mott and Davis [19], the activation energy alone does not provide any indication to whether conduction takes place in extended state above the mobility edge or by hopping in the localized state.…”
Section: Resultsmentioning
confidence: 99%
“…This is because the density of lattice defects as vacancies, interstitials and dislocations, developed during the deposition of thin film are lowered with the increase of film thickness. Thus, film resistance is decreased and the conductivity is increased with the film thickness [24]. According to Mott and Davis [25], the activation energy alone does not provide any indication to whether the conduction takes place in the extended states near the mobility edge or by hopping in the localized states.…”
Section: Temperature Dependence Of the DC Electrical Conductivity Formentioning
confidence: 99%
“…This led to adapt and elab- * Corresponding author. orate models allowing the electronic properties of these materials to be described [10][11][12][13][14].…”
Section: Introductionmentioning
confidence: 99%