Abstract:A Ni/amorphous SiC (a-SiC) multilayered sample was prepared by ion-beam sputtering and was used as a model system to study the stability of metal contacts with a-SiC against interface reactions. The diffusion of Ni into the a-SiC layer as well as Si and C into the Ni layer takes place concurrently during the annealing process. An intermediate NiSi phase was identified in the Ni solution layer because of diffusion of Si and C resulting from the decomposition of a-SiC. A phase selection diagram has been develope… Show more
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