2015
DOI: 10.1002/pip.2725
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Interdigitated back‐contact heterojunction solar cell concept for liquid phase crystallized thin‐film silicon on glass

Abstract: We present an interdigitated back-contact silicon heterojunction system designed for liquid-phase crystallized thin-film (~10 μm) silicon on glass. The preparation of the interdigitated emitter (a-Si:H(p)) and absorber (a-Si:H(n)) contact layers relies on the etch selectivity of doped amorphous silicon layers in alkaline solutions. The etch rates of a-Si:H(n) and a-Si:H(p) in 0.6% NaOH were determined and interdigitated back-contact silicon heterojunction solar cells with two different metallizations, namely A… Show more

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Cited by 19 publications
(19 citation statements)
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References 24 publications
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“…One cell type is an interdigitated back-contact (IBC) system featuring an amorphous hydrogenated silicon (a-Si:H)/crystalline silicon heterojunction (SHJ) 18 with a cell size of 0.6 cm 2 similar to the one described in ref. 19 while the other is a small rectangular test structure. This cell is also back-junction-back-contacted, but only the emitter is counted as cell area.…”
Section: Sample Preparationmentioning
confidence: 99%
See 1 more Smart Citation
“…One cell type is an interdigitated back-contact (IBC) system featuring an amorphous hydrogenated silicon (a-Si:H)/crystalline silicon heterojunction (SHJ) 18 with a cell size of 0.6 cm 2 similar to the one described in ref. 19 while the other is a small rectangular test structure. This cell is also back-junction-back-contacted, but only the emitter is counted as cell area.…”
Section: Sample Preparationmentioning
confidence: 99%
“…Contrary to the 0.6% NaOH solution used in ref. 19, a 2.5% solution of (TMAH) was deployed for development. It is a metal-ion-free developer solution which is described by Tabata el al.…”
Section: Sample Preparationmentioning
confidence: 99%
“…This is explained by the etch rate of the (p)a-Si:H emitter in alkaline etchants, which is low compared with the etch rate of the (n)a-Si:H emitter. This difference in etch rates for doped amorphous Si layers has been described previously, and has been exploited for selective etching of heterojunction emitters [7], [22]. On n-type c-Si samples, the (p)a-Si:H emitter therefore acts as an etch barrier.…”
Section: Methodsmentioning
confidence: 69%
“…Laser structuring was performed on the full area for the lifetime samples, and for cell samples only on the area of the cell test structures (1 cm 2 ). Line pitch and laser width were not specifically adapted, instead they were chosen to fit an already existing lithography process used for the metallization of thin film silicon samples [22]. The laser spot width can be adapted by changing the beam shaping optical element or the focus conditions to obtain wider contact stripes.…”
Section: Methodsmentioning
confidence: 99%
“…The spectra measured within microcrystals of the absorber present the same features as spectra of crystalline silicon wafers without showing defect luminescence indicating the high electronic material quality of the liquid-phase multi-crystalline layer after hydrogen plasma treatment. [1][2][3][4][5][6] comparable to industrial and highest efficient multi-crystalline wafer solar cells. 7 Therefore, LPCSG presents a promising material to fabricate solar cells and modules.…”
mentioning
confidence: 99%