2008
DOI: 10.1016/j.tsf.2007.10.014
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Interaction between hydrogen plasma and hydrogenated amorphous carbon film, investigated by infrared spectroscopy

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Cited by 17 publications
(14 citation statements)
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“…This, in turn, influences the physical and chemical properties of the films. It was shown that the hydrogen ions and radicals stabilize sp 3 C-C bonding [7]. Specifically, hydrogen ion etches the amorphous carbon more efficiently compared to hydrogen radicals.…”
Section: Introductionmentioning
confidence: 99%
“…This, in turn, influences the physical and chemical properties of the films. It was shown that the hydrogen ions and radicals stabilize sp 3 C-C bonding [7]. Specifically, hydrogen ion etches the amorphous carbon more efficiently compared to hydrogen radicals.…”
Section: Introductionmentioning
confidence: 99%
“…However, the transformation into the sp 3 -CH 1-2 components would be suppressed. According to our previous report [4], the hydrogen ions physically etch the film; especially the polymer-like sp 3 -CH x was easily etched. Thereby, the sp 3 -CH x components would be preferentially etched by the hydrogen ions in this process.…”
Section: Resultsmentioning
confidence: 90%
“…The details of mechanisms, especially the chemical states during growth, have not yet been entirely understood. We have used infrared absorption spectroscopy in multiple internal reflection geometry (MIR-IRAS) to investigate the adsorption process of the hydrocarbon species generated in methane plasma [3][4][5].…”
mentioning
confidence: 99%
“…Appropriate monomers can form SAMs on a Si surface by siloxane (Si-O) bonds [21]. This advantage is particularly beneficial for us, because we have developed "infrared absorption spectroscopy in multiple internal reflection geometry" (MIR-IRAS) using MIR prism made from a Si wafer [30][31][32][33][34]. The study investigates the reaction of atmosphericair plasma with the abovementioned SAM using MIR-IRAS.…”
Section: Introductionmentioning
confidence: 99%