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Reactions of surface hydrocarbon components exposed to hydrogen plasma at a substrate temperature of 200 °C were investigated by in-situ infrared spectroscopy, and changes in film thickness were measured. Both the concentration of hydrocarbon components and film thickness decreased because of the hydrogen plasma exposure. The decrease in the former was larger than that in the latter. These results indicate that the abstraction effect of surface hydrogen, as well as the etching effect, was enhanced at 200 °C.

Substrate bias effects on deposition process of amorphous carbon film during acetylene plasma were investigated by using infrared absorption spectroscopy in multiple internal reflection geometry (MIR-IRAS). IRAS spectra showed that the relative density of sp 3-hydrocarbon was decreased with substrate bias while that of the sp 2-C and that of sp-CH were increased. Furthermore, the film was formed with the transformation of the adsorbed species generated in acetylene plasma. It suggested that owing to substrate bias, the polymer components were etched and the density of carbon-carbon bonds was increased during deposition.

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