1994
DOI: 10.1109/68.265889
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Integration of waveguides and photodetectors in SiGe for 1.3 /spl mu/m operation

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Cited by 73 publications
(24 citation statements)
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“…850 nm) but in regimes with absorption depths larger than one micrometer either the speed requirements have to be reduced (10 GHz) or the responsivity for high speed applications (40-80 GHz) is below the ideal one. For this case lateral incidence devices offer advantages because absorption lengths and carrier transport lengths are decoupled allowing an optimization of both [11].…”
Section: Resultsmentioning
confidence: 99%
“…850 nm) but in regimes with absorption depths larger than one micrometer either the speed requirements have to be reduced (10 GHz) or the responsivity for high speed applications (40-80 GHz) is below the ideal one. For this case lateral incidence devices offer advantages because absorption lengths and carrier transport lengths are decoupled allowing an optimization of both [11].…”
Section: Resultsmentioning
confidence: 99%
“…The dark current density of this device at a reverse bias of 5 V is below 1 . 103A/crn2 [24]. Such a high dark current density does not seem inherent in SiGe/Si-superlattices, since in [9] a dark current density of 8 .…”
Section: Fabricated Devices 41 Sigewaveguide Detector Integrationmentioning
confidence: 93%
“…Alternatively, polyimide waveguides can be used to direct light to an array of MSM photodiodes [81]. Most approaches, however, employ a form of evanescent coupling between a transparent waveguide layer and an absorbing photodetector: coupling between InGaAsP and InGaAs [82], SiON and a-Si [83], and SiGe and a stack of SiGe quantum wells [84] have been demonstrated. In addition, Si technology easily allows monolithic integration of a photodetector with a silicon-based waveguide [61].…”
Section: Photodetector Integrationmentioning
confidence: 99%