2006 IEEE Workshop on Microelectronics and Electron Devices, 2006. WMED '06.
DOI: 10.1109/wmed.2006.1678303
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Integrated silicon nanowire diodes

Abstract: IV-measurements were performed on integrated silicon nanowires grown via atmospheric vapor phase epitaxy. The silicon nanowires were grown on a n-type substrate using gold catalysts, insulated using a spin-on glass, and contacted using aluminum. Rectifying behavior and low recombination is observed in the nanowire with a forward bias.

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