Integrated computational study of ultra-high heat flux cooling using cryogenic micro-solid nitrogen spray

Ultra-high heat flux cooling characteristics of cryogenic micro-solid nitrogen particles and its application to semiconductor wafer cleaning technology

“…The most advantageous factor of the SN 2 spray cooling system is the utilization of the direct contact heat transfer SN 2 particles and latent heat transport with phase change which avoids the film boiling state. Also, ultra-short time scale heat transfer in a thin boundary layer is more possible than in LN 2 spray [1]. When micro-SN 2 particulate flow was used, as an ultra-high cooling heat flux level was achieved during operation, a better cooling performance was obtained than that with liquid nitrogen (LN 2 ) spray cooling [1].…”

“…In recent years, thermal-fluid mechanical high functionality of cryogenic fine solid particles of micron size has been noted in the field of ultra-high heat flux cooling technology in application to high thermal emission devices [1]. In order to make effective use of the high performance of such cryogenic solid particles in the field of advanced nano technology, our laboratory has developed a new physical semiconductor cleaning method which employs cryogenic spray [2,3].…”

Development of Environmental Harmony Resist Removal System using Cryogenic Particulate Spray

“…[1] It is numerically found that the atomization of LN 2 droplet is induced by shear flow between LN 2 and gaseous nitrogen (GN 2 ) flow. Sequentially, liquid to solid phase change is enhanced and solid nitrogen (SN 2 ) particle is continuously created by LN 2 droplet freezing.…”

“…Thermal-fluid mechanical high functionality of cryogenic fine solid particles of micron to nano size has been noted not only in the field of ultra-high heat flux cooling technology in application to high thermal emission devices [1], but also in the field of non-aqueous physical nano-device cleaning technologies [2]. In order to make effective use of the high performance of such cryogenic solid particles in the field of advanced nano technology, our laboratory has developed a new physical semiconductor cleaning method which employs cryogenic spray [3].…”

“…When the flow was induced internal section of Laval nozzle, the subcooled LN 2 -gaseous nitrogen (GN 2 ) two-phase flow is atomized and LN 2 droplet is generated at the throat, and high-speed ultra-fine SN 2 particle is continuously generated due to the freezing of LN 2 droplet induced by rapid adiabatic expansion of transonic subcooled two-phase GN 2 -LN 2 flow passing through the Laval nozzle. Furthermore, in our previous research [1], the macroscopic thermal characteristics of solid nitrogen (SN 2 ) spray cooling performance has been partially made clear. However, microscopic heat transfer and hydrodynamic behavior of single cryogenic SN 2 particle impinging on heated substrate have not been sufficiently investigated.…”