1992
DOI: 10.1063/1.108260
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InGaAs/AlGaAs strained quantum well laser with semi-insulating low temperature GaAs and lateral n-p-n current confinement structures grown by molecular beam epitaxy

Abstract: A combination of a lateral n-p-n junction using an amphoteric doping of Si in GaAs and a semi-insulating GaAs grown at low temperature is applied for the first time to a novel current confinement structure for an index-guided InGaAs strained quantum well laser grown by two-step molecular beam epitaxy. A threshold current of 7.4 mA and total external differential quantum efficiency of 59% under room temperature continuous wave operation are achieved with devices fabricated by a self-aligned process.

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Cited by 13 publications
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“…Subramanian et al (85) have demonstrated the utility of GaAs : As for isolation between tandem solar cells. There have also been many demonstrations of the applications of GaAs : As as a current-block ing layer in diode lasers (86)(87)(88).…”
Section: Device Applicationsmentioning
confidence: 99%
“…Subramanian et al (85) have demonstrated the utility of GaAs : As for isolation between tandem solar cells. There have also been many demonstrations of the applications of GaAs : As as a current-block ing layer in diode lasers (86)(87)(88).…”
Section: Device Applicationsmentioning
confidence: 99%