Influence of manufacturing process of indium tin oxide sputtering targets on sputtering behavior

Modified Pechini Synthesis of Oxide Powders and Thin Films

“…Due to excellent properties ITO has found numerous technological applications such as flat panel displays, touch panels, energy-efficient windows and solar cells. ITO thin films are industrially prepared by sputtering, where targets with high density are required (Gehman et al 1992). It has been known for decades that it is difficult to obtain In2O3 and ITO with high density (Vojnovich and Bratton 1975;Nadaud et al 1994), which has caused a considerable interest in the synthesis and sintering of nano-crystalline In2O3 and ITO.…”

Sintering of Additive Free Hydrothermally Derived Indium Tin Oxide Powders in Air

“…However, it was reported (4) that an oxide target is easier to use than a metallic one due to its lower sensitivity to minor changes in sputtering parameters. The sputtering e$ciency and properties of the sputtered "lms strongly depend on the characteristics of the sputtering targets (4,5). Dense targets increase the deposition rates and exhibit a more stable resistivity of the deposited "lms (6).…”

Sintering of Transparent Conductive Oxides: From Oxide Ceramic Powders to Advanced Optoelectronic Materials

“…Target materials that happen to feature the increased densification, are more suitable for sputtering processes since they exhibit fewer nodule failures (Schlott, et al, 1995, Gehman, et al, 1992. The shape of nodules has been investigated by SEM analysis and partly a distinct peak is observed, partly a flattened conical shape is formed (Schlott, et al, 1996).…”