2016
DOI: 10.1016/j.solmat.2016.01.024
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Influence of As/group-III flux ratio on defects formation and photovoltaic performance of GaInNAs solar cells

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Cited by 34 publications
(40 citation statements)
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“…Moreover, the properties of these materials are very dependent on the growth conditions and post-growth thermal treatments [4][5][6][7]. Therefore, in order to obtain actual properties of the GaNAsSb alloy suitable for modeling purposes, several characterization techniques have been applied on GaNAsSb samples with doping levels in the range of 1•10 17 and 1•10 18 cm -3 for both n-type and p-type.…”
Section: Determination Of Ganassb Materials Parametersmentioning
confidence: 99%
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“…Moreover, the properties of these materials are very dependent on the growth conditions and post-growth thermal treatments [4][5][6][7]. Therefore, in order to obtain actual properties of the GaNAsSb alloy suitable for modeling purposes, several characterization techniques have been applied on GaNAsSb samples with doping levels in the range of 1•10 17 and 1•10 18 cm -3 for both n-type and p-type.…”
Section: Determination Of Ganassb Materials Parametersmentioning
confidence: 99%
“…Accordingly, in the following, we will use dilute nitride material diffusion lengths for the material (i.e. any Ga(In)NAs(Sb) material) similar to those already achieved experimentally [1,[4][5][6] (in the order of 10 times higher than the ones extracted from the EQE in Fig. 1.a) In order to usefully incorporate the Ga(In)NAs(Sb) into a 4Junction device, the demands on this material in terms of photocurrent are very high because this subcell receives the lowest spectral power density (the maximum photocurrent under ideal collection efficiency is 14.2 mA/cm 2 while for the other subcells it is about 16 mA/cm 2 ).…”
Section: Modeling the Performance Of 4-junction Solar Cellsmentioning
confidence: 99%
“…, 15 and of non-radiative recombination centers. Post-growth annealing improves the quality of InGaAsN dilute nitrides.…”
Section: à3mentioning
confidence: 99%
“…It is worth noting that a p-type background doping is typical for i-layers of dilute nitrides (In)GaAsN grown by MBE. 14,15 Usually, it is associated with non-equilibrium growth conditions at low temperatures that lead to the formation of gallium vacancies and nitrogen-related defects of acceptor type in dilute nitrides but a complete description and explanation of background doping in InGaAsN layers should be investigated in further experiments. Nevertheless, in our InAs/GaAsN layers, the background doping values are several times lower than those found for InGaAsN layers grown by MBE without Sb in the articles cited above (more than 1.0 Â 10 16 cm…”
Section: à3mentioning
confidence: 99%
“…[8][9][10] High background doping level narrows the depletion region, which together with the short diffusion length limits the thickness of an optimized absorption layer, resulting in lower quantum efficiencies. [9][10][11][12] To obtain wider depletion regions and higher quantum efficiencies, the p-type background doping should be reduced down to the order of 10 15 cm À3 or below, which still remains a challenging task at high N compositions (y ! 0.04).…”
mentioning
confidence: 99%