Influence of annealing conditions on the photoelectrocatalytic performance of WO3 nanostructures

Degradation of Methylparaben Using Optimal WO3 Nanostructures: Influence of the Annealing Conditions and Complexing Agent

“…From Bode phase diagrams ( Figure 4 c,d), for both complexing agents, H 2 O 2 and citric acid, a wide peak was appreciated in all the annealing conditions, which is likely to be an indicator of the superposition of the two individual peaks [ 48 ]. The results are very similar in all cases, although for both complexing agents, it can be appreciated that the phase angle was lower for 600 °C, indicating more resistance, thus, better photoelectrochemical properties [ 45 ].…”

Fabrication of novel direct Z-scheme + isotype heterojunction photocatalyst g-C3N4/TiO2 with peroxymonosulfate (PMS) activation synergy and 2D/0D structure

“…The conduction band of the semiconductor is calculated using the Mott–Schottky (MS) electrochemical technique in order to further examine the photocatalytic mechanism of TCN-UT composites. The Mott–Schottky equation 48,49 states: . where C s , N , e , and E refer to the total interface capacitance, current density, fundamental charge, and applied potential, respectively.…”

“…Based on the following equation: The conduction band of the semiconductor is calculated using the Mott-Schottky (MS) electrochemical technique in order to further examine the photocatalytic mechanism of TCN-UT composites. The Mott-Schottky equation 48,49 states:…”

Improving Photoelectrochemical Activity of Magnetron-Sputtered Double-Layer Tungsten Trioxide Photoanodes by Irradiation with Intense Pulsed Ion Beams

“…In this regard, etching and surface passivation could help to improve surface electron–hole kinetics, reduce the overpotential of thin films, and achieve an improvement in photoelectric conversion [ 20 ]. Moreover, type annealing in various atmospheres is another method that has been used to improve the photocatalytic activities of various materials because annealing has a significant impact on the structural properties of materials [ 21 , 22 ]. Approaches such as laser and ion irradiation may be used during the deposition or post-deposition treatments for tuning electrical, morphological, and structural characteristics [ 23 , 24 , 25 ].…”