2013
DOI: 10.1109/tdmr.2012.2217396
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In Situ Investigation of Current Transport Across Pt/n-Si (100) Schottky Junction During 100 $\hbox{MeV Ni}^{+7}$ Ion Irradiation

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Cited by 23 publications
(11 citation statements)
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“…After a threshold total dose the generation and recombination rates of these e-h pairs reaches equilibrium and hence the partial recovery in the electrical characteristics is observed. Similar results have been observed after swift heavy ion irradiation [5]. The threshold fluence in case of 100 MeV Ni ions irradiation on Pt/n-Si interface occurred near 4 × 10 12 ions cm −2 [5].…”
Section: Discussionsupporting
confidence: 82%
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“…After a threshold total dose the generation and recombination rates of these e-h pairs reaches equilibrium and hence the partial recovery in the electrical characteristics is observed. Similar results have been observed after swift heavy ion irradiation [5]. The threshold fluence in case of 100 MeV Ni ions irradiation on Pt/n-Si interface occurred near 4 × 10 12 ions cm −2 [5].…”
Section: Discussionsupporting
confidence: 82%
“…Similar results have been observed after swift heavy ion irradiation [5]. The threshold fluence in case of 100 MeV Ni ions irradiation on Pt/n-Si interface occurred near 4 × 10 12 ions cm −2 [5]. The recovery in gamma irradiated SB interface also starts around 340 Mrad (Si) which is equivalent to ∼ 2 × 10 12 ions cm −2 fluence of 100 MeV Ni ion beam.…”
Section: Discussionsupporting
confidence: 81%
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“…This type of effect has been observed in Schottky diodes exposed to swift heavy ions. [41][42][43][44] The higher charge state beams produced in the EBIT have lower beam currents; therefore, devices irradiated at higher charge states require a longer irradiation time to reach a given fluence compared to devices irradiated with lower charge states. So, it is possible that the longer irradiation time for the highest fluence point for the Ar 11+ data set shows a reduced effect due to an increased amount of room-temperature annealing.…”
Section: B Data Analysismentioning
confidence: 99%