Quantification algorithms for radiofrequency glow discharge optical emission spectroscopy (r.f. GDOES) calibration and analysis are briefly reviewed. These include corrections for emission yield, self-absorption, spectral interferences and relative sputtering rates. The emission yield term is then expanded to allow variable power calibration. The use of sputter factors to determine relative sputtering rates is explored. Finally, pulsed r.f. operation is considered and compared with continuous power operation in an alloy steel calibration and in the qualitative depth profile of a heat-sensitive coated glass.