2015
DOI: 10.1039/c5tc00048c
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Improvements in the bending performance and bias stability of flexible InGaZnO thin film transistors and optimum barrier structures for plastic poly(ethylene naphthalate) substrates

Abstract: Bending characteristics of flexible oxide thin-film transistors could be enhanced by optimizing the barrier layers on the polyethylene naphthalate substrate.

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Cited by 51 publications
(49 citation statements)
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“…114,155 Since standard PI exhibits a yellowish to brownish color, other polymeric substrates have been introduced to benefit from their transparency in the visual wavelength range. These materials, which are, in general, also cheaper and more easily available, include PET, 29,69,96,165,171,180,184,188 polyethylene naphthalate (PEN), 38,40,41,134,136,139,149,153,158,163,[166][167][168]173,181,202 polyetheretherketone (PEEK), 203 polycarbonate (PC), 154,157 polypropylene (PP) based synthetic paper, 204 parylene, 80,141 polyethersulfone (PES), 178 water-soluble polyvinyl alcohol (PVA), 82 as well as polydimethylsiloxane (PDMS). 78,132,147,[205][206][207] In particular, PDMS is also stretchable and biocompatible, but at the same time hard to process using standard fabrication techniques.…”
Section: Methodsmentioning
confidence: 99%
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“…114,155 Since standard PI exhibits a yellowish to brownish color, other polymeric substrates have been introduced to benefit from their transparency in the visual wavelength range. These materials, which are, in general, also cheaper and more easily available, include PET, 29,69,96,165,171,180,184,188 polyethylene naphthalate (PEN), 38,40,41,134,136,139,149,153,158,163,[166][167][168]173,181,202 polyetheretherketone (PEEK), 203 polycarbonate (PC), 154,157 polypropylene (PP) based synthetic paper, 204 parylene, 80,141 polyethersulfone (PES), 178 water-soluble polyvinyl alcohol (PVA), 82 as well as polydimethylsiloxane (PDMS). 78,132,147,[205][206][207] In particular, PDMS is also stretchable and biocompatible, but at the same time hard to process using standard fabrication techniques.…”
Section: Methodsmentioning
confidence: 99%
“…RF and RF-magnetron sputtering have been used to deposit IGZO, 23,[80][81][82]96,132,[134][135][136]139,145,147,152,155,156,202,208 IZO, 184 GZO, 188 and ZnO. 59,78,177,178,180 Furthermore, IGZO was also deposited by DC sputtering 133,137,153,160,168 and pulsed DC sputtering.…”
Section: Fabrication Techniquesmentioning
confidence: 99%
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