2007
DOI: 10.1109/ted.2007.896603
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Improvement of 4H-SiC Power p-i-n Diode Switching Performance Through Local Lifetime Control Using Boron Diffusion

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Cited by 19 publications
(12 citation statements)
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“…The complex impedance of CCTO/PC film samples was measured using an impedance analyzer (Agilent model 4192A LF) [51][52][53]. Measurements were carried out at fixed applied voltage (10 mV) and varying frequency (typically 10 2 to 1.2 9 10 7 Hz).…”
Section: Characterization Methodsmentioning
confidence: 99%
“…The complex impedance of CCTO/PC film samples was measured using an impedance analyzer (Agilent model 4192A LF) [51][52][53]. Measurements were carried out at fixed applied voltage (10 mV) and varying frequency (typically 10 2 to 1.2 9 10 7 Hz).…”
Section: Characterization Methodsmentioning
confidence: 99%
“…In spite of the significant research efforts invested by many groups, these carrier transport mechanisms are still not well understood. Several publications highlight on the change of ideality factor, forward voltage, relative light intensity, carrier lifetime and reverse recovery time of LEDs with temperature (Weling et al 2011;Acharya and Vyavahare 1999;Dalapati et al 2013;Bergman et al 1995;Chen et al 2012;Hull et al 2008;Bolotnikov et al 2007). These literatures show that the variations of these factors with temperature for different types of LED are not same.…”
Section: Introductionmentioning
confidence: 99%
“…For a long time, selective doping in SiC technology has been implemented mostly with ion implantation. Diffusion doping was considered to be impractical due to low diffusion coefficients of impurities at temperatures below 1800 • C, and the interest in diffusion in SiC was generally related to applications requiring "drive-in" annealing after implantation (see, e.g., [1][2][3]). Papers devoted to "classic" thermal diffusion in SiC were mostly limited to early years [4,5].…”
Section: Introductionmentioning
confidence: 99%
“…Papers devoted to "classic" thermal diffusion in SiC were mostly limited to early years [4,5]. However, recent achievements in fabrication of SiC-based microelectronic devices using diffusion doping [1,2,6] stirred renewed interest in diffusion in SiC.…”
Section: Introductionmentioning
confidence: 99%
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