We reported the effect of bandgap grading of absorbers on the performance of a-Si1−xGex:H cells employingμc-SiOx:Hn-layer. The influence of bandgap grading widths extended from thep-layer (thep/igrading) and then-layer (thei/ngrading) to the absorber on the cell performance which were systematically studied. Thep/igrading reduced the interface defects and thus improved theVOC. The reducedJSCand FF were presumably due to the degraded hole transport by the potential gradient ofp/igrading. Increasing thei/ngrading width improved the carrier collection significantly. The EQE, theJSC, and the FF were improved substantially. Bias-dependent EQE revealed that the carrier collection is efficient in the cell employing optimali/ngrading. On the other hand, increasing thei/ngrading width was accompanied by the decrease in long-wavelength response which potentially constrained thei/ngrading width. Compared to the cell without grading, the a-Si1−xGex:H cells with optimalp/iandi/ngrading width improved the efficiency from 5.5 to 7.5%.