Imprint lithography for curved cross-sectional structure using replicated Ni mold

Hirai, Yoshihiko; Harada, Satoshi; Kikuta, Hisao; Tanaka, Yoshio; Okano, Masato; Isaka, Satoshi; Kobayasi, Michio

doi:10.1116/1.1515305

Cited by 56 publications

(31 citation statements)

References 15 publications

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“…These data indicate that the micromachined PMMA by PBW can be used as a template for the electroplating. Coupled with the capability of the PBW for structures with high aspect ratio up to 20 (Uchiya et al 2007), the PBW can be a promising tool for making molds with high aspect ratio for imprint lithography process (Hirai et al 2002;Heidari et al 2000;Pfeiffer et al 2002;Taniguchi et al 2002;Schulz et al 2000;Guo 2004).…”

Section: Methodsmentioning

confidence: 99%

Ni electroplating on a resist micro-machined by proton beam writing

et al. 2008

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In this paper we report fabrication of highaspect-ratio micro-structure of Ni by electroplating, using a micro-machining technique of resists using proton beam writing (PBW) at Japan Atomic Energy Agency (JAEA). A micro-structure of 5 lm thick PMMA was fabricated by exposure using PBW at 1.7 MeV and by development. A Ni structure was then formed by electroplating on the micro-structure of PMMA. Vertical and smooth side walls observed by a scanning electron microscope (SEM) indicate that PBW can be a versatile tool for fabrication of resists and metal microstructure in combination with electroplating. The electroplated Ni structure can be used as a resolution standard, which enabled us to focus the proton beam down to 130 nm.

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Section: Methodsmentioning

confidence: 99%

Ni electroplating on a resist micro-machined by proton beam writing

et al. 2008

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“…Such "LIGA press"-based hot embossing processes can produce high quality products. Electroplated nickel molds 57,102 and Reactive Ion Etching (RIE) or Deep Reactive Ion Etching (DRIE) made quartz molds 19,82 have been used in many applications. Silicon 5,24,89 and polymeric 15,135 molds have also been fabricated.…”

Section: Hot Embossing Lithographymentioning

confidence: 99%

Polymer Nanoengineering for Biomedical Applications

Lee

2006

Ann Biomed Eng

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Polymeric materials possess many attractive properties such as high toughness and recyclability. Some possess excellent biocompatibility, are biodegradable, and can provide various bio-functionalities. Proper combination of functional polymers and biomolecules can offer tailored properties for various biomedical applications. This overview article covers three major sections: Applications of Polymeric Structures and Devices, Nanoscale Polymer Fabrication Technologies, and Conclusions and Future Directions.

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“…In the past two decades, a substantial amount of work have been conducted in solving these technical difficulties [2,14,[23][24][25][26][27][28]. Broad applications of NIL have been witnessed, particularly in the manufacture of nanostructures [29][30][31][32], nanodevices [33,34], optic components [35,36], highdensity quantized magnetic disks [37] and Si MOSFETs [38][39][40][41][42][43][44][45][46][47][48][49][50][51][52], etc. This paper will review some of the applications by NIL in these areas through several examples.…”

Section: Introductionmentioning

confidence: 99%

Applications of nanoimprint lithography/hot embossing: a review

Chen

2015

Appl. Phys. A

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This review concentrates on the applications of nanoimprint lithography (NIL) and hot embossing for the fabrications of nanolectronic devices, nanophotonic metamaterials and other nanostructures. Technical challenges and solutions in NIL such as nanofabrication of templates, removal of residual resist, pattern displacement in thermal NIL arising from thermal expansion are first discussed. In the nanofabrication of templates, dry etch in plasma for the formation of multi-step structures and ultra-sharp tip arrays in silicon, nanophotonic chiral structures with high aspect ratio in SiC are demonstrated. A bilayer technique for nondestructive removal of residual resist in thermal NIL is described. This process is successfully applied for the fabrication of T-shape gates and functional high electron mobility transistors. However, pattern displacement intrinsically existing in thermal NIL/hot embossing owing to different thermal expansions in the template and substrate, respectively, limits its further development and scale-up. Low temperature even room temperature NIL (RTNIL) was then proposed on HSQ, trying to eliminate the pattern distortion by avoiding a thermal loop in the imprint. But, considerable pressure needed in RTNIL turned the major attentions to the development of UVcuring NIL in UV-curable monomers at low temperature. A big variety of applications by low-temperature UV-curing NIL in SU-8 are described, including high-aspect-ratio phase gratings, tagging technology by nanobarcode for DNA sequencing, nanofluidic channels, nanophotonic metamaterials and biosensors. Hot embossing, as a parallel technique to NIL, was also developed, and its applications on ferroelectric polymers as well as metals are reviewed. Therefore, it is necessary to emphasize that this review is mainly attempted to review the applications of NIL/embossing instead of NIL technique advances.

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Imprint lithography for curved cross-sectional structure using replicated Ni mold

Abstract: Comparative study of resolution limiting factors in electron beam lithography using the edge roughness evaluation method

Cited by 56 publications

References 15 publications

Ni electroplating on a resist micro-machined by proton beam writing

Ni electroplating on a resist micro-machined by proton beam writing

Polymer Nanoengineering for Biomedical Applications

Applications of nanoimprint lithography/hot embossing: a review

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