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We propose achromatic quarter-wave plates of a subwavelength grating structure. When the period of the grating structure is smaller than the wavelengths of the incident light, the structure is considered to be an optically anisotropic medium. The effective refractive indices strongly depend on the wavelengths, especially when the period is close to the wavelength. Using this feature, we can design a grating quarter-wave plate whose phase retardation is maintained at pi/2 for a wide wavelength range. A design method using the effective medium theory is described, and the wave plates designed were evaluated by numerical calculation with a rigorous electromagnetic grating theory. The calculation results led to the possibility of an achromatic quarter-wave plate whose retardation errors are smaller than 3 degrees for a +/-10% change in wavelength.

An antireflection surface with sub-wavelength structure has been successfully fabricated on a fused silica substrate. The fabricated antireflection structured surface consists of a microcone array of fused silica with a period shorter than the wavelengths of visible light. The microcone array is made by a reactive ion etching method using fluorocarbon plasma. A microdisk array of chromium thin film, formed by an electron-beam lithography and lift-off process, is used as the etching mask. Since an electric field induced near the substrate was focused on the edges of the metal disks, these disks gradually shrank. Consequently, a conical shape was formed. The fabricated cone array has a period of 250 nm and a height of 750 nm. Measured reflectivity of the antireflection structured surface is less than 0.5% in the wavelength range of 400–800 nm for normal incidence.