Polarization-multiplexed phase-only diffractive optical elements with subwavelength structures are proposed and fabricated. The differences among the phase modulations result from the differences among the effective indices exhibited in the subwavelength structures with various filling factors and surface profiles, and the phase retardations are obtained by the relief depth of the structures. The polarization-selective property is achieved by the polarization dependence of the effective indices exhibited in the one-dimensional subwavelength structures and the polarization independence exhibited in the two-dimensional structures. Additionally, the polarization contrast of our polarization-multiplexed elements, defined as the cross talk between the two polarization incidences, is independent of the relief depth. The principle of the polarization multiplexing by use of the subwavelength structures is described, and the fabrication results for the polarization-multiplexed computer-generated holograms are demonstrated.
A conventional method to synthesize diffractive optical elements and computer-generated holograms (CGH's) with high diffraction efficiency relies on an increase of phase levels. To fabricate such a device, one should perform electron-beam (e-beam) lithography with multiple-dose exposures or multiple-step photolithography. Here we describe a one-step method, which is based on the effective medium theory, for the fabrication of a multilevel phase CGH. The phase modulations required in cells of a CGH are constructed by means of dividing these cells into fine (subwavelength) structures. The surface features of these fine structures control their corresponding indices, and their values can be calculated according to the effective medium theory. By proper selection of the fine structures, based on the requirements of the phase modulation of the cells, a CGH with multilevel phases is synthesized when a binary structure is relieved on the dielectric material. Then the CGH can be fabricated by direct e-beam lithography or one-step photolithography through an amplitude mask followed by an ion-etching treatment. The experimental results showed that the reconstructed wave field is in good agreement with that simulated by a computer, indicating the effectiveness of the proposed method.
We developed a novel fabrication method of a reduced wavelength-dependent quarter-wave plate (QWP) based on form birefringence of a multilayered subwavelength structure. The multilayered structure was constructed by depositing a high-refractive-index thin film on a subwavelength-structured substrate with a low refractive index. The surface structure of the substrate was shallow enough to be formed by a mass replication technology. A high-refractive-index subwavelength grating was formed on ridges of the substrate by sputtering Zn2SnO4 (refractive index of 2.03 at a wavelength of 633 nm). Moreover, since the grooves of the high-refractive-index grating were very deep and narrow, the dispersion of form birefringence suppressed the dependency of phase retardance on the wavelength of light in a limited spectral region. The phase retardance of the fabricated QWP was 89 degrees at a 633 nm wavelength and 79 degrees at a 785 nm wavelength.
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