Implantation of anatase thin film with 100 keV 56Fe ions: Damage formation and magnetic behaviour

Localised modifications of anatase TiO2 thin films by a Focused Ion Beam

“…AFM analysis of the irradiated surfaces shows a gradual decrease in RMS roughness from a value of 3.2 nm at an ion fluence of 10 16 ions/cm 2 to less than 1 nm for the highest fluence. The same surface morphology has been observed after implantation with 100 keV Fe + ions to an ion fluence of 3 Â 10 16 ions/cm 2 [4].…”

“…3, shows very clearly that the surface has a grainy morphology with 'crystallites' of %50-150 nm in size [4]. There are gaps between the individual grains, giving the top surface a very rough or protruding appearance.…”

“…There are gaps between the individual grains, giving the top surface a very rough or protruding appearance. In addition, a cross-sectional cut of the as-deposited sample, shows that the film has a columnar structure [4], which depending on the deposition parameters, is well-known to occur in sputter-deposited thin films [25,26].…”

“…During the deposition the substrate was heated to 300°C using a front side radiation heater. The deposition resulted in a polycrystalline anatase film with a mean thickness of 475 nm [4].…”

“…The presence of dopants may significantly change the properties of TiO 2 . Specifically, metal doping influences the magnetic [4,5] and optical properties [6] and has been used to narrow its energy gap in order to shift the photo-catalytical activity from UV to visible light [7]. Gallium-doped titanium dioxide has been used both for this aim [8] and as a catalyst in industrially important reactions of selective oxidation [9].…”