2013 Transducers &Amp; Eurosensors XXVII: The 17th International Conference on Solid-State Sensors, Actuators and Microsystems 2013
DOI: 10.1109/transducers.2013.6627037
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Impact on film bulk acoustic resonator tempco and quality factor from boron doped SiO<inf>2</inf> temperature compensation material

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Cited by 3 publications
(4 citation statements)
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“…Putting SiO 2 at the high stress region of BAW is an excellent method, thus a minimum amount of SiO 2 is used without large k eff 2 reduction and Q-values loss [ 95 ]. Furthermore, a higher positive temperature compensation can be operated by using boron doped SiO 2 or SiOF as the temperature compensation layer [ 98 ]. Tokihiro Nishihara et al [ 99 ] studied three structures of TC-FBAR with SiOF layer ( Figure 15 a).…”
Section: Temperature Compensationmentioning
confidence: 99%
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“…Putting SiO 2 at the high stress region of BAW is an excellent method, thus a minimum amount of SiO 2 is used without large k eff 2 reduction and Q-values loss [ 95 ]. Furthermore, a higher positive temperature compensation can be operated by using boron doped SiO 2 or SiOF as the temperature compensation layer [ 98 ]. Tokihiro Nishihara et al [ 99 ] studied three structures of TC-FBAR with SiOF layer ( Figure 15 a).…”
Section: Temperature Compensationmentioning
confidence: 99%
“…Compared with FBAR, SMR-BAW shows a huge potential in temperature compensation when using a positive material as the low impedance layer. According to the research [ 98 ], as the number of Bragg reflection layers increases, the TCF becomes smaller. In addition, increasing the thickness of the first SiO 2 layer below the piezoelectric film ( d 1 ) can also decrease TCF.…”
Section: Temperature Compensationmentioning
confidence: 99%
“…In 2011, Matsuda et al [30] studied the TCE of SiOF films, and found that the TCF of SAW devices increased with the fluorine content. In 2013, Zou et al [31] found that FBAR with boron-doped silica exhibited a high positive TCF and effective electromechanical coupling coefficient (Kt 2 ), and the value of TCF is related to the concentration of boron. By doping different PH 3 flow rate, the TCE and thermal expansion coefficient of SiO 2 material might be modulated, and the TCF of device would change accordingly.…”
Section: Mag(z 11 )mentioning
confidence: 99%
“…After doping fluorine in SiO 2 as the temperature-compensated layer, the electromechanical coupling coefficient (k 2 t ) can be increased to 6.26%, and a TCF of −11.1 ppm/ • C can be achieved [22]. Meanwhile, after doping boron in SiO 2 as the temperature-compensated layer, a TCF of up to −1.5 ppm/ • C was obtained with an improved quality factor (Q) value [23]. Thus, the doped SiO 2 temperature-compensated layer is suitable for the production of broadband filters.…”
Section: Introductionmentioning
confidence: 99%