Impact of ferromagnetic layer thickness on the spin pumping in Co60Fe20B20/Ta bilayer thin films

Abstract

in step of 1nm) using ion-beam sputtering technique.2. Structural and morphological study using X-ray diffraction (XRD), X-ray reflectivity (XRR), Atomic Force Microscopy (AFM) and Energy Dispersive X-ray (EDX) analysis.3. A detailed analysis of spin pumping based on range of Co60Fe20B20 and Ta thicknesses.4. Low thicknesses of Co60Fe20B20 (4 & 6nm) follow normal spin pumping behaviour while anomaly is present in thick Co60Fe20B20 (8nm) film heterostructure.

High temperature stability in few atomic layer MoS2 based thin film heterostructures: structural, static and dynamic magnetization properties

“…The absence of CoFe(110) Bragg diffraction at ∼45.1°signifies that CoFeB remained in the amorphous state even after thermal annealing. [55][56][57] Generally, the choice of seed and capping layers plays a crucial role in determining the crystallinity of CoFeB. 58 In the case of CoFeB, the presence of Boron (B) as a light element can lead to its migration from the CoFeB matrix towards the seed or capping layer during annealing.…”

Spin Pumping through Different Spin–Orbit Coupling Interfaces in β-W/Interlayer/Co2FeAl Heterostructures

“…The credit behind such low interface roughness goes to the unique benefit that ion beam deposition technique offers. In that, the working pressure during deposition is almost 2 orders lower than the magnetron sputtering as the plasma utilized for sputtering is formed in a separate chamber. , The large surface area (dia = 6 in.) of the sputtering target takes care of the uniformity of the grown layers in the samples (size = 10 × 10 mm 2 ) even at substantially lower thicknesses.…”