2014 IEEE 40th Photovoltaic Specialist Conference (PVSC) 2014
DOI: 10.1109/pvsc.2014.6925255
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Identifying parasitic current pathways in CIGS solar cells by modelling dark JV response

Abstract: Document VersionPublisher's PDF, also known as Version of Record (includes final page, issue and volume numbers) Please check the document version of this publication:• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the… Show more

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Cited by 7 publications
(13 citation statements)
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References 19 publications
(27 reference statements)
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“…Analysis of Figure reveals that the prolonged reaction time results in a selenized thin film that has slightly larger grains (Figure (d)) compared with the hot reaction condition (Figure (c)). This reduces the number of grain boundaries and, in turn, the number of shunt pathways and is evidenced by the higher R SH value.…”
Section: Resultsmentioning
confidence: 99%
“…Analysis of Figure reveals that the prolonged reaction time results in a selenized thin film that has slightly larger grains (Figure (d)) compared with the hot reaction condition (Figure (c)). This reduces the number of grain boundaries and, in turn, the number of shunt pathways and is evidenced by the higher R SH value.…”
Section: Resultsmentioning
confidence: 99%
“…Non-ohmic shunts can have several origins, of which tunneling at the CdS/CIGS interface due to high concentration of deep defects and shunts along grain boundaries are the most likely candidates. 50 Since it is more severe under blue light and related to the KF treatment, we think it comes from tunneling at CdS/CIGS junction. Similar results are obtained for the covered cells as well.…”
Section: Solar Cellsmentioning
confidence: 98%
“…The (400 nm thick) Mo layer was generated by DC sputtering, the CIGS (1.5 mm) by co-evaporation (Ga/(Ga þIn) ¼ 0.3), the CdS (80 nm) by chemical bath deposition, the i-ZnO (60 nm) by either thermal-ALD or RF sputtering (see below), and the ZnO:Al (200 nm, resistivity, ρ¼5 Á 10 À 4 Ω cm, and sheet resistance, R sheet ¼25 Ω/□) by RF sputtering at room temperature. This fabrication process is the same as has been reported before [8], besides the introduction of ALD i-ZnO. All cells reported here were completed by evaporation of Ni/Ag/Ni finger contacts, and defined by scribing into individual cells (5 mm  10 mm).…”
Section: Standard Cell Fabrication Proceduresmentioning
confidence: 99%
“…Throughout this manuscript, comparisons are primarily made between the best cells (upper quarters of data sets) in order to focus on the effect of the i-ZnO on the obtainable performance, and to exclude the influence of heavily shunted cells (the prevalence of which is discussed in Section 3.3), which are a result of randomly distributed CIGS defects (see Ref. [8]) -Cu-spitting during co-evaporation results in the formation and fall-off of CuSe x particles. The spatial distribution of these across a 10 cm  10 cm sample appears to be random, and consecutive CIGS depositions show a negligible variation in the extent of Cu-spitting, but over the time scale of months, the prevalence can vary.…”
Section: Effect Of I-zno Resistivity On Obtainable Cigs Efficiencymentioning
confidence: 99%
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